dbr structure, led chip, semiconductor light-emitting device, manufacturing method, and display panel
A technology for LED chips and light-emitting devices, applied in semiconductor devices, electric solid-state devices, electrical components, etc., can solve the problems of large chip light leakage, not considering chip light reflection, affecting the optical performance of end products, etc., to improve and reduce light leakage problems. Front light transmittance, the effect of improving the display effect
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Embodiment 1
[0095] This embodiment provides a distributed Bragg reflection structure, such as Figure 3a As shown, the distributed Bragg reflection structure (DBR structure) 100 of this embodiment includes multiple reflective film groups 1001 , and the multiple reflective film groups form a first film stack structure 101 and a second film stack structure 102 .
[0096] Such as Figure 3a As shown, in an optional embodiment of this embodiment, each reflective film group 1001 in the DBR structure 100 includes a first material layer 1011 and a second material layer 1012 stacked in sequence, and the first material layer 1011 and the second material layer 1011 The two material layers 1012 have different refractive indices. In the stacking direction of the membrane stack structure, the second membrane stack structure 102 is located above the first membrane stack structure 101 , and both the first membrane stack structure 101 and the second membrane stack structure 102 include a plurality of re...
Embodiment 2
[0104] This embodiment provides an LED chip, such as Figure 5 As shown, the LED chip 300 includes a substrate 301, the substrate 301 includes a first surface and a second surface opposite to each other; a light-emitting epitaxial layer formed on the first surface of the substrate 301, and a DBR structure on the second surface.
[0105] In this embodiment, the light-emitting epitaxial layer may include a first semiconductor layer 303, a quantum well layer 304, and a second semiconductor layer 305 sequentially formed on the first surface of the substrate 301. A buffer layer 302 is also formed between the layers 303 . Taking the GaN epitaxial layer as an example, the above-mentioned first semiconductor layer is n-type GaN, and the second semiconductor layer is p-type GaN. Such as Figure 6 As shown, the LED chip also includes an electrode 306 formed above the light-emitting epitaxial layer, and the electrode 306 includes a first electrode 3061 and a second electrode 3062 resp...
Embodiment 3
[0112] This embodiment provides a semiconductor light emitting device, such as Figure 6 As shown, the semiconductor light emitting device 200 includes:
[0113] Packaging bracket 201, the mounting bracket 201 can be any mounting bracket suitable for mounting and fixing LED chips. Such as Figure 6 As shown, in an alternative embodiment of this embodiment, the packaging bracket 201 is provided with a packaging groove on one side of the mounting layer, and the packaging groove is used for accommodating and mounting LED chips. An electrode layer 202 is provided on the bottom of the mounting side of the packaging support 201 , and the electrode layer 202 includes two electrode layers arranged at intervals, respectively connected to the electrodes of the LED chip.
[0114] LED chip 300, refer to Figure 5 and combine Figure 7 ~ Figure 9 , the LED chip 300 includes:
[0115] A substrate 301, the substrate 301 includes a first surface and a second surface oppositely arranged; ...
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Abstract
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Claims
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