Unlock instant, AI-driven research and patent intelligence for your innovation.

Gas path diagram implementation method and device based on IAP platform

A realization method, gas circuit technology

Pending Publication Date: 2021-05-04
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] One or more embodiments of the present invention provide a method and device for realizing a gas circuit diagram based on an IAP platform to solve the problem that it is difficult to change the gas circuit diagram in time in the existing gas circuit diagram implementation method

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Gas path diagram implementation method and device based on IAP platform
  • Gas path diagram implementation method and device based on IAP platform
  • Gas path diagram implementation method and device based on IAP platform

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] One or more embodiments of the present invention provide a method and device for realizing a gas circuit diagram based on an IAP platform to solve the problem that it is difficult to change the gas circuit diagram in time in the existing gas circuit diagram implementation method.

[0024] In order to enable those skilled in the art to better understand the technical solutions in one or more embodiments of the present invention, the following will describe the technical solutions in one or more embodiments of the present invention in conjunction with the drawings in one or more embodiments of the present invention The technical solution is clearly and completely described, and obviously, the described embodiments are only some embodiments of the present invention, rather than all the embodiments. Based on one or more embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the p...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

One or more embodiments of the invention disclose a gas path diagram implementation method and device based on an IAP platform. The method and device are used for solving the problem that a gas path diagram is difficult to change in time in an existing gas path diagram implementation mode. The method comprises the steps of receiving a drawing request for the gas path diagram, wherein the drawing request carries file identification information of an editable file corresponding to the gas path diagram; based on the file identification information, reading the editable file, and obtaining attribute information of each target control in the gas path diagram stored in the editable file and an association relationship between the attribute information of each target control and control data in the IAP platform; according to the association relationship, obtaining control data corresponding to the attribute information of each target control from the IAP platform; and according to the attribute information of each target control, generating a gas path diagram on the gas path diagram editing interface, and displaying the attribute information of each target control and / or corresponding control data on the gas path diagram. According to the scheme, timely change of the gas path diagram can be ensured.

Description

technical field [0001] The invention relates to the technical field of semiconductor manufacturing, in particular to a method and device for realizing an air circuit diagram based on an IAP platform. Background technique [0002] The gas circuit diagram is an indispensable part of the semiconductor manufacturing equipment control software system, and it can feed back the process gas circuit status of a semiconductor manufacturing equipment in a relatively intuitive form. Since semiconductor manufacturing equipment produces different products, the corresponding process gas paths have certain differences. As more and more products are developed, in order to respond to hardware changes related to the process gas path of semiconductor manufacturing equipment in a timely manner, The design of the gas circuit diagram puts forward the requirement of rapid iteration. [0003] The existing gas path diagram adopts the program interface design method, and the process gas path that nee...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06F30/12G06F111/20
CPCG06F30/12G06F2111/20
Inventor 肖托黄扬君刘建涛刘耀琴
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD