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A Method for Improving the Measurement Accuracy of Nonlinear Optical Coefficients of Thin Film Materials

A nonlinear optics, measurement accuracy technology, applied in transmittance measurement and other directions, can solve the problem of nonlinear signal strength approaching, overlapping, unable to guarantee the accuracy of the measurement results, etc., to improve the measurement accuracy and suppress the impact.

Active Publication Date: 2021-10-08
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

In this study, the nonlinear signal of the thin film material was separated by comparing the signals of the two arms. However, the nonlinear signal of the bare substrate is too large, so that the signals of the two arms are very close. This phenomenon has a negative impact on the measurement accuracy of the final thin film material. certain influence
In addition, for SiO 2 For thin-film materials with low nonlinear coefficients, usually due to the large difference in physical thickness between the thin-film material and the substrate, or the similar nonlinear coefficients of the two, the nonlinear signal strengths of the thin-film element and the bare substrate are too close or even overlap. Therefore, the accuracy of the measurement results cannot be guaranteed

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  • A Method for Improving the Measurement Accuracy of Nonlinear Optical Coefficients of Thin Film Materials
  • A Method for Improving the Measurement Accuracy of Nonlinear Optical Coefficients of Thin Film Materials
  • A Method for Improving the Measurement Accuracy of Nonlinear Optical Coefficients of Thin Film Materials

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Embodiment Construction

[0028] Specific examples of the present invention will be described in detail below with reference to the accompanying drawings.

[0029] This example is selected from 50 μmmgf 2 Substrate, film material is SiO 2 . Use electron beam evaporation technology to 200nmsio 2 Film plating in 50 μmmgf 2 On the substrate, if figure 1 Indicated.

[0030] Test the nonlinear optical coefficient of the film material using Z scanning technology. figure 2 A schematic diagram of the arduced Z scanning device. Where the incident laser is a femtosecond pulse laser, the wavelength is 515 nm, the pulse width is 230Fs, the pulse repetition frequency is 1 kHz, the front radius of the focus is 4 mm, the convex lens coating is 150 mm.

[0031] The following is measured as an example, and the 200 nmsio is measured. 2 Nonlinear signal of the film:

[0032] Determination 50μmmGF 2 The energy range of nonlinear absorption effects in the blank substrate, such as image 3 As shown, when the incident single puls...

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Abstract

The invention discloses a method for improving the measurement accuracy of the nonlinear optical coefficient of thin-film materials, by selecting a material with ultra-thin thickness and ultra-low nonlinear optical coefficient as the substrate of the thin-film element, and simultaneously measuring the substrate containing the The nonlinear signal of the thin film device and the bare substrate, because the nonlinear response of the substrate is very small or even negligible, the nonlinear signal of the thin film material occupies a dominant position in the total signal of the thin film and the substrate, thereby improving the Z-scan technology in the thin film The measurement accuracy in the process of measuring nonlinear optical coefficients of state materials.

Description

Technical field [0001] The present invention relates to a nonlinear optical, material, optical electronics, and a method of determining a nonlinear optical coefficient of thin film material. Background technique [0002] Since the inventions in 1960, nonlinear optics have developed rapidly, and the attention of nonlinear optical properties of materials is also higher and higher. The technical method for determining the nonlinear optical coefficient of the material mainly has three harmonic methods, nonlinear interference, degenerate four harmonic methods, and Z scanning method. [0003] In 1989, the M.Sheik-Bahae topic reported Z scanning method for the first time, because of its simpleness and high sensitivity, Z scanning technology is widely used in the nonlinear characteristic characterization of materials. In 2019, the question group first proposed a nonlinear optical coefficient test method for thin film material - using a bire arm Z scanning technology to remove a nonlinear...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01N21/59
CPCG01N21/59
Inventor 邵建达陈美玲胡国行朱美萍张恺馨王尧刘永江左旭超
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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