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Method for improving measurement precision of nonlinear optical coefficient of thin-film-state material

A technique of nonlinear optics and measurement accuracy, applied in the interdisciplinary fields of optoelectronics, nonlinear optics, and materials science, it can solve the problems of closeness and overlap of nonlinear signal intensity, and the accuracy of measurement results cannot be guaranteed, so as to improve the measurement accuracy. , the effect of suppressing influence

Active Publication Date: 2021-06-04
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

In this study, the nonlinear signal of the thin film material was separated by comparing the signals of the two arms. However, the nonlinear signal of the bare substrate is too large, so that the signals of the two arms are very close. This phenomenon has a negative impact on the measurement accuracy of the final thin film material. certain influence
In addition, for SiO 2 For thin-film materials with low nonlinear coefficients, usually due to the large difference in physical thickness between the thin-film material and the substrate, or the similar nonlinear coefficients of the two, the nonlinear signal strengths of the thin-film element and the bare substrate are too close or even overlap. Therefore, the accuracy of the measurement results cannot be guaranteed

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  • Method for improving measurement precision of nonlinear optical coefficient of thin-film-state material
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  • Method for improving measurement precision of nonlinear optical coefficient of thin-film-state material

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Embodiment Construction

[0028] Specific examples of the present invention will be described in detail below with reference to the accompanying drawings.

[0029] In this example, the base material selected is 50μmMgF 2 The substrate, the film material is SiO 2 . 200nm SiO2 was prepared by electron beam evaporation technology 2 Thin films plated on 50μmMgF 2 on the base, as figure 1 shown.

[0030] Using Z-scan technology to test the nonlinear optical coefficient of thin film materials, figure 2 Schematic diagram of the dual-arm Z-scanning device. The incident laser is a femtosecond pulse laser with a wavelength of 515 nm, a pulse width of 230 fs, a pulse repetition frequency of 1 kHz, a beam waist radius of 4 mm before focusing, and a convex lens focal length of 150 mm.

[0031] The following takes the measurement of the two-photon coefficient of thin film materials as an example to measure 200nm SiO 2 Nonlinear signals for thin films:

[0032] 1. Determination of 50 μm MgF 2 The energy ra...

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Abstract

The invention discloses a method for improving the measurement precision of a nonlinear optical coefficient of a thin-film-state material. By selecting a material with ultra-thin thickness and ultra-low nonlinear optical coefficient as a substrate of a thin-film element, and measuring the nonlinear signals of a thin-film device containing the substrate and a bare substrate at the same time through employing a double-arm Z scanning technology, as the non-linear response of the substrate is very small and even can be ignored, the non-linear signal of the thin film state material is dominant in the total signal of the thin film and the substrate, so that the measurement precision of the Z scanning technology in the process of measuring the non-linear optical coefficient of the thin film state material is improved.

Description

technical field [0001] The invention relates to the interdisciplinary technical field of nonlinear optics, materials science and optoelectronics, in particular to a method for measuring nonlinear optical coefficients of thin-film materials. Background technique [0002] Since the invention of the laser in 1960, nonlinear optics has developed rapidly, and people have paid more and more attention to the nonlinear optical properties of materials. The technical methods for determining the nonlinear optical coefficient of materials mainly include the third harmonic method, the nonlinear interference method, the degenerate fourth harmonic method, and the Z scanning method. [0003] In 1989, the research group of M. Sheik-bahae reported the Z-scan method for the first time. Due to its simplicity and high sensitivity, Z-scan technology has been widely used in the characterization experiments of nonlinear properties of materials. In 2019, the research group first proposed a method f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/59
CPCG01N21/59
Inventor 邵建达陈美玲胡国行朱美萍张恺馨王尧刘永江左旭超
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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