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OCR Layout Analysis Method Based on Gini Impurity

A technology of layout analysis and purity, applied in the fields of instrumentation, calculation, electrical and digital data processing, etc., can solve the problem of inability to judge the typesetting information of image and text, and achieve the effect of improving the accuracy.

Active Publication Date: 2022-08-05
上海勃池信息技术有限公司
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Problems solved by technology

The current OCR recognition can achieve high accuracy with the blessing of deep learning algorithms, but the deep learning recognition algorithm itself only outputs all the text recognition results in the image, and cannot judge the typesetting information of the image text, let alone the recognition results Matching with meaningful fields greatly limits the application of OCR in complex scenarios

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  • OCR Layout Analysis Method Based on Gini Impurity
  • OCR Layout Analysis Method Based on Gini Impurity
  • OCR Layout Analysis Method Based on Gini Impurity

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Embodiment Construction

[0038] OCR is a common application in the field of image processing. The current OCR model based on deep learning can achieve accurate positioning and recognition of text in images. How to get text typography letters information and further extraction of effective text information , is still an open problem in OCR identification.

[0039] The invention proposes an OCR layout analysis method based on Gini impurity. By finding the dividing line with the smallest Gini impurity in the image, and then judging the typesetting direction of the text in the image by the position and direction of the dividing line, invalid recognition can be filtered out based on the typesetting direction. As a result, the final and effective OCR recognition text information is obtained.

[0040] The technical solutions of the present invention will be further described below with reference to the specific embodiments and the accompanying drawings. figure 1 Show the schematic flow sheet of the OCR l...

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Abstract

The OCR layout analysis method based on Gini impurity of the present invention includes: obtaining an initial OCR identification result including position information and confidence score; dividing all identification results into two categories of high confidence and low confidence according to the confidence score; Starting from the left side of the image, set multiple vertical separation lines at certain intervals. Similarly, starting from the upper side of the image, set multiple horizontal separation lines at certain intervals; use the vertical separation lines to divide the recognition result into two parts: left and right. , the horizontal dividing line divides the recognition result into upper and lower parts; for each dividing line, calculate the Gini impurity of the left and right or the upper and lower parts respectively, and then calculate the total Gini impurity according to the Gini impurity of the upper and lower / left and right; take all the divisions The line with the smallest Gini impurity in the line is used as the final dividing line; the layout of the image is judged by the position and direction of the final dividing line, and the text recognition results on the side with less high-confidence texts are filtered out; The fields are matched to get the final recognition result.

Description

【Technical field】 [0001] The invention mainly relates to the technical field of image processing and OCR, and in particular to an OCR (Optical Character Recognition) layout analysis method based on Gini impurity. 【Background technique】 [0002] OCR is one of the classic tasks in image processing and is widely used in various industries. At present, OCR recognition can achieve high accuracy under the blessing of deep learning algorithm, but the deep learning recognition algorithm itself only outputs all text recognition results in the image, but cannot judge the typesetting information of the image text, let alone the recognition results. Matching with meaningful fields greatly limits the application of OCR in complex scenarios. [Content of the invention] [0003] The purpose of the present invention is to overcome the deficiencies of the prior art, and to provide a layout analysis method for OCR recognition results. Matches provide valid information. In order to realize...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06V20/30G06V30/414G06V10/764G06K9/62G06F40/189
CPCG06F40/189G06V30/414G06V20/62G06V30/10G06F18/24323
Inventor 刘星辰何盼陈晓峰麻沁甜
Owner 上海勃池信息技术有限公司