Multi-element gas mixing and proportioning device capable of regulating and controlling gas mixing proportion

Abstract

The invention discloses a multi-element gas mixing and proportioning device capable of regulating and controlling the gas mixing proportion. The device comprises: a gas storage chamber used for storing injected multi-element gas; an anti-return mechanism arranged on the side wall of the gas storage chamber in a penetrating manner; and a ventilation pre-storage mechanism mounted at the top end of the gas storage chamber and connected with the anti-return mechanism, wherein the ventilation pre-storage mechanism comprises a ventilation semi-sealing pipe connected to the gas storage chamber in a penetrating mode, a plurality of pre-storage components and a sealing component. According to the invention, gas with a metered volume can be temporarily pre-stored through the pre-storage components, so that the problem that injection control over small-volume gas is difficult is solved; and in a specific implementation process, a plurality of gases are directly introduced into the anti-return mechanism through the plurality of gas ports, one or more gas ports are sealed through the sealing component so as to control the types of gases entering the anti-return mechanism, then the gas entering the gas ports is stored through the pre-storage components, and the stored gas is divided into multiple strands of metering gas so as to carry out metering gas compensation when the gas mixing proportion is adjusted.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a multi-element gas mixing and proportioning device capable of regulating the gas mixing ratio. Background technique [0002] The gas industry term, the gas used in the semiconductor industry is collectively referred to as electronic gas. According to its category, it can be divided into three categories: pure gas, high-purity gas and semiconductor special material gas. Special material gases are mainly used in epitaxy, doping and etching processes; high-purity gases are mainly used as diluent gases and carrier gases, and semiconductor special material gases need to be mixed and proportioned during preparation, and there are various types of gases to be mixed. Mixed gases The proportioning device has also been developed. [0003] At present, there are relatively few manufacturers of gas mixing and proportioning devices in China, and they are basically producing ordinary ...

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Problems solved by technology

[0007] The purpose of the present invention is to provide a multi-component gas mixing and proportioning device with adjustable gas mixing ratio to solve the technical problem in the prior art that it is difficult to control the injection volume when injecting a single gas in a small volume

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