A plasma processing system and its multi-stage Faraday shielding device

Abstract

The invention discloses a plasma processing system and a multi-segment Faraday shielding device, comprising a conductive ring, and a plurality of conductive petal-shaped components radially symmetrically arranged on the outer periphery of the conductive ring; A connection capacitor; the multi-segment conductive plates of each conductive petal-shaped component are arranged radially spaced apart; a connection capacitor is arranged between every two adjacent conductive plates; each connection capacitor includes an upper electrode plate and a lower electrode plate; The lower end face and / or the upper end face of the lower electrode plate are provided with an insulating coating; and the lower end face of the upper electrode plate is connected with the upper end face of the lower electrode plate; the upper electrode plate is conductively connected to one of the two adjacent conductive plates. ; The lower electrode plate is conductively connected to the other one of the two adjacent conductive plates; the plurality of conductive plates are located on the same plane. Compared with the existing multi-stage Faraday shielding device, the invention has low processing cost, simple installation and positioning, and does not occupy space in the vertical direction.

Description

technical field [0001] The invention belongs to the technical field of semiconductor etching, and in particular relates to a plasma processing system and a multi-segment Faraday shielding device. Background technique [0002] Patent document CN110491760A discloses a Faraday cleaning device and a plasma treatment system, such as Figure 11 , including a reaction chamber 3 and a radio frequency coil 4; a dielectric window 301 is provided above the reaction chamber 3; a nozzle is provided in the middle of the dielectric window 301; the lower electrode 6. The plasma processing system further includes a Faraday shielding device 201 ; the Faraday shielding device 201 is placed on the dielectric window 301 . The radio frequency coil 4 is placed on the Faraday shielding device 201 . [0003] This patent divides the Faraday segments and uses capacitive connections between them, so that the radio frequency distribution in the entire dielectric window tends to be uniform, so that the...

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Problems solved by technology

[0003] The patent divides the Faraday segments and adopts capacitive connections between them, so that the distribution of radio frequency in the entire dielectric window tends to be consistent, so that the cleaning of the entire bottom surface of the dielectric window tends to be uniform; it is used to solve the problem of the integrated Faraday plate on the coupling window on the top of the cavity. The outer edge area is cleaned thoroughly, but the central area is not cleaned thoroughly

[0004] However, the existence of the capacitor connection increases the space occupied by the Faraday structure, and the upper surface is uneven, which increases the difficulty of installing the RF coil; in addition, the installation and positioning of the Faraday plate and the capacitor is very difficult; and the dielectric layer of the capacitor here requires The thickness will be less than 0.1mm, and the manufacturing cost is high

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