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Retroreflective sheet provided with pattern for improving retroreflection coefficient

A retro-reflection and patterning technology, applied in optical components, optics, instruments, etc., can solve the problems of difficulty in manufacturing, difficult to meet the standard of viewing angle of light, high retro-reflection coefficient, etc., to improve the retro-reflection coefficient, improve visibility, improve safety effect

Pending Publication Date: 2022-04-29
MIRAENANOTECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Due to the characteristics of retroreflective patterns that reflect in the opposite direction of the path of incident light, it is difficult to manufacture products with a high coefficient of retroreflection (coefficient of retro-reflection (RA) cd / lx / m2) at the viewing angle of light
In order to improve the retroreflection coefficient of the light viewing angle, try to change the size and shape of the pattern, but it is difficult to meet the standard of the light viewing angle (KS A 3507XI)

Method used

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  • Retroreflective sheet provided with pattern for improving retroreflection coefficient
  • Retroreflective sheet provided with pattern for improving retroreflection coefficient
  • Retroreflective sheet provided with pattern for improving retroreflection coefficient

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Embodiment Construction

[0027] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. When describing the present invention, if it is judged that the detailed description of related known structures or functions will make the gist of the present invention unclear, the detailed description will be omitted. Preferred embodiments of the present invention will be described below, however, the technical spirit of the present invention will not be limited or restricted by the preferred embodiments, and can be modified and implemented in various forms by those skilled in the art. Hereinafter, the retroreflective sheeting provided with the pattern for increasing the coefficient of retroreflection proposed by the present invention will be described in detail with reference to the accompanying drawings.

[0028] The term "layer" used in the present invention includes the meaning of film (film) type and / or sheet (sheet) type, and "pat...

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Abstract

Disclosed is a retroreflective sheet including a pattern for improving a retroreflective coefficient. A retroreflective sheet according to an embodiment of the present invention comprises: a substrate layer comprising a polymer resin; a light path induction layer which is in contact with the lower surface of the substrate layer and contains an adhesive resin; and a pattern layer which is in contact with the lower surface of the optical path induction layer and has a cube corner pattern and an additional pattern formed on different surfaces.

Description

technical field [0001] The present invention relates to a retroreflective sheeting provided with a pattern for increasing the coefficient of retroreflection. Background technique [0002] What is described herein is merely to provide background information to the embodiments of the present invention and does not constitute prior art. [0003] Conventional retroreflective sheeting is a product produced by enlarging a metal mold produced by replication on a plate-like disk processed into a triangular-pyramidal pattern. Due to the characteristics of retro-reflective patterns that reflect in the opposite direction of the path of incident light, it is difficult to manufacture products with a high coefficient of retro-reflection (RA) cd / lx / m2 at the viewing angle of light. In order to improve the retroreflection coefficient of the light viewing angle, try to change the size and shape of the pattern, but it is difficult to meet the standard of the light viewing angle (KS A 3507XI)...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/124
CPCG02B5/124G02B5/122
Inventor 李浚溶裵澯烈
Owner MIRAENANOTECH
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