Path planning method and readable storage medium

A path planning and trajectory technology, applied in computer-aided planning/modeling, image enhancement, image analysis, etc., can solve the problems of increasing patient discomfort, time-consuming, etc., to reduce discomfort, improve safety, and shorten path planning. effect of time

Pending Publication Date: 2022-07-05
BEIJING GALAXY CIRCUMFERENCE TECH CO LTD +1
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

On the one hand, the path planning process relies on the doctor's experience, which puts forward higher requirements on the doctor's level, and also brings higher risks due to strong subjectivity
On the other hand, this path planning process takes about 2-3 hours, which will be very time-consuming and increase the discomfort of the patient

Method used

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  • Path planning method and readable storage medium
  • Path planning method and readable storage medium
  • Path planning method and readable storage medium

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Embodiment Construction

[0021] The technical solutions of the present invention will be further described in detail below through embodiments and in conjunction with the accompanying drawings. In the specification, the same or similar reference numerals refer to the same or similar parts. The following description of the embodiments of the present invention with reference to the accompanying drawings is intended to explain the general inventive concept of the present invention, and should not be construed as a limitation of the present invention.

[0022] In an embodiment of the present invention, a path planning method is provided. like figure 1 As shown, the path planning method includes the following steps:

[0023] Step S1 determines a target area (for example, by determining a target area in response to a first operation on the user interface), and generates at least a plurality of targets in the target area and at least a plurality of key structures according to the target area. First risk i...

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Abstract

The invention discloses a path planning method and a readable storage medium, and belongs to the field of computer data processing. The path planning method comprises the following steps: S1, determining a target spot area, and generating first risk information between a plurality of target spots in the target spot area and a key structure according to the target spot area; s2, obtaining a confirmation target spot in the multiple target spots according to the first risk information, and determining a skull reference point area according to the confirmation target spot; s3, constructing a to-be-confirmed track between the confirmation target spot and the skull reference point area, and generating second risk information between the to-be-confirmed track and the key structure according to the to-be-confirmed track; and S4, obtaining a determined track according to the second risk information. The method can assist the user in safely and efficiently planning the path.

Description

technical field [0001] The invention relates to the field of computer data processing, in particular to a path planning method and a readable storage medium. Background technique [0002] In the field of surgical cranial intervention, it is sometimes necessary to place an interventional device within a patient's cranial cavity using surgical tools such as electrodes for epilepsy treatment, intervention in the cochlear region, or treatment of cancerous objects within the skull. Stereo-Electroencephalography (SEEG) or Deep Brain Stimulation (DBS) require placement of such electrodes along preset trajectories for the corresponding therapeutic purpose. [0003] For example, SEEG technology locates the epilepsy-onset area by recording the electrical discharges in the epilepsy patient's brain by implanting depth electrodes in the epilepsy patient's cranial cavity. In practice, an average of 7-12 electrodes are implanted in the cranial cavity of a patient, and the electrode path i...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61B34/10G06T5/00G06T5/20G06T7/12G06T7/13G06T7/155
CPCA61B34/10G06T7/12G06T7/13G06T7/155G06T5/002G06T5/20G06T2207/10081G06T2207/10088G06T2207/30016G06T2207/30101A61B2034/107A61B2034/108
Inventor 张维王伟伟付晓璇
Owner BEIJING GALAXY CIRCUMFERENCE TECH CO LTD
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