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Format grid vertex alignment method based on stitching relation and storage medium

A technology of grid vertices and first pattern, applied in CAD customization/personalization, instrumentation, design optimization/simulation, etc., can solve problems such as uneven grid vertices, inconsistent numbers, and difficult alignment of pattern grids, and achieve pattern The effect of uniform vertices, consistent number, and improved uniformity of the sheet mesh

Pending Publication Date: 2022-07-29
广州鑫景信息科技服务有限公司
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  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to disclose a pattern grid vertex alignment method and storage medium based on the stitching relationship, which solves the problems of uneven pattern grid vertices, inconsistent numbers, and difficulty in alignment in the existing virtual clothing simulation technology

Method used

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  • Format grid vertex alignment method based on stitching relation and storage medium
  • Format grid vertex alignment method based on stitching relation and storage medium
  • Format grid vertex alignment method based on stitching relation and storage medium

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0063] like Figure 1-11 A method for aligning pattern mesh vertices based on a stitching relationship shown in Embodiment 1 includes the following steps:

[0064] S1. Extract the vertices of the multi-segment curves in each pattern with a stitching relationship, and record them as the first projection point group corresponding to each pattern. Each point will record its parameter value on the curve. The first projection point group is as follows Three kinds: outer ring point group, inner ring point group and inner curve point group.

[0065] S2. Sort the first projection point groups corresponding to each pattern according to the curve parameter value from small to large to form a curve corresponding to each pattern. The curve is divided into an outer loop curve, an inner loop curve and an inner curve.

[0066] S3, optimize the outer ring curve, inner ring curve and inner curve corresponding to each pattern, and the specific steps are as follows:

[0067] S3.1. Intersect th...

Embodiment 2

[0097] As a further improvement to Embodiment 1, Embodiment 2, a method for aligning pattern mesh vertices based on stitching relationship, further includes

[0098] Step S10, in step S9, the stitched and aligned pattern mesh vertex V is obtained i After that, the mesh shape can be adjusted by adjusting mesh vertices V i The position of Vi is further changed, and the new coordinates of Vi are obtained by calculating the average coordinates of the mesh vertices adjacent to Vi:

[0099]

[0100] In the formula, V i Represents the current mesh vertex, V j means all and V i Connected mesh vertices, t represents the number of mesh vertices adjacent to Vi; i, j, and t are all positive integers. like Figure 12 As shown in the figure, by adjusting the position of the mesh vertex Vi and adjusting the mesh shape, the mesh shape is made more reasonable. After the mesh is optimized, both the connection status of the mesh vertices and the uniformity of the mesh edges will be signi...

Embodiment 3

[0103] Embodiment 3 A pattern grid vertex alignment method based on stitching relationship, comprising the following steps:

[0104] S1. Respectively extract the vertices of the multi-segment curves in each pattern with a stitching relationship, and record them as the first projection point group corresponding to each pattern. The first projection point group is divided into three types: the outer ring point group, the inner ring point group and the inner curve point group;

[0105] S2, sorting the first projection point group corresponding to each pattern according to the curve parameter value to form the outer loop curve, inner loop curve and inner curve corresponding to each pattern;

[0106] S3, optimize the outer ring curve, inner ring curve and inner curve corresponding to each pattern, and the specific steps are as follows:

[0107] S3.1. Intersect the inner curve and the outer ring curve corresponding to each pattern, the inner curve and the inner ring curve, and the ...

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Abstract

The invention discloses a board grid vertex alignment method based on a stitching relation and a storage medium. According to the board grid vertex alignment method based on the stitching relation, the generated board grid vertexes are uniform and consistent in number, free stitching, multiple stitching and indirect stitching are supported, and the method is suitable for more application scenes.

Description

technical field [0001] The invention relates to the technical field of clothing computer-aided design, in particular to a pattern grid vertex alignment method and storage medium based on a stitching relationship. Background technique [0002] Computer-aided design technology is widely used in the garment industry. Since the birth of the technology, the production efficiency and product quality of garment processing have been greatly improved. In particular, the virtual clothing simulation technology has entered a stage of rapid development in recent years. The 3D clothing prototype is restored to a 2D pattern that can be cut and sewed, and then the 2D pattern is sewn into a 3D garment to display the garment forming effect, which is the center of the formation of virtual simulation clothing. link. [0003] In the clothing design application, by loading the DXF file and the 3D human body model in the clothing CAD design application, and parsing the DXF file, the clothing patt...

Claims

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Application Information

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IPC IPC(8): G06F30/20G06F111/16G06F113/12
CPCG06F30/20G06F2111/16G06F2113/12
Inventor 李亚平李昌旺王哲江肖宇
Owner 广州鑫景信息科技服务有限公司
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