Information processing apparatus, information processing method, article manufacturing system, and article manufacturing method

Abstract

The invention discloses an information processing apparatus, an information processing method, and an article manufacturing system and method. The information processing apparatus includes: an acquisition unit configured to acquire information including a processing result of processing a substrate by a substrate processing apparatus configured to perform substrate processing at a first timing, event information related to an event occurring in the substrate processing apparatus at a second timing after the first timing, and a processing result of processing the substrate by the substrate processing apparatus at a third timing after the second timing; and a display control unit configured to perform, based on the information acquired by the acquisition unit, control such that the display device displays a chronologically arranged graph of processing results including the processing results at the first timing and the processing results at the third timing, the display control unit performs control to display information indicating the second timing on a graph in an overlay manner.

Description

technical field [0001] The present disclosure relates to an information processing apparatus, an information processing method, an article manufacturing system, and an article manufacturing method. Background technique [0002] In a semiconductor manufacturing plant, a plurality of semiconductor manufacturing apparatuses such as substrate processing apparatuses for processing substrates are generally installed, and accurate determination of the operating state of each apparatus and efficient substrate processing based on the determination are desired. In addition, it is desired to quickly resolve an abnormality that occurs in a semiconductor manufacturing apparatus. [0003] Japanese Patent Application Laid-Open No. 2009-170612 discusses a technique for detecting an abnormality in a semiconductor manufacturing apparatus. Specifically, the processing results of the semiconductor manufacturing apparatus are statistically processed for each batch including a plurality of subst...

AI Technical Summary

Problems solved by technology

[0004] Although it is possible to identify the batch in which an abnormality occurred based on statistical processing results, it is difficult to identify the cause of the abnormality

For example, it is difficult to immediately determine whether the abnormality is caused by the operation of the device or by changes in the device over time

So it takes a long time to resolve the exception

Images