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Directional gas purge to reduce excimer discharge chamber window dirt retention

A window and optical window technology, applied in electrical components, circuits, phonon exciters, etc., can solve problems such as high beam flux, poor laser performance, and optical damage

Pending Publication Date: 2022-08-05
西默有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Metal fluoride dust can deposit on optical windows of MO, PA and / or PRA and can cause optical damage
The beam fluence is higher in PA or PRA (not MO), so metal fluoride dust may cause earlier optical damage to PA or PRA over time
In addition, cycling of metal fluoride dust in MO, PA and / or PRA may also lead to lower discharge voltage of electrodes and poor laser performance

Method used

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  • Directional gas purge to reduce excimer discharge chamber window dirt retention
  • Directional gas purge to reduce excimer discharge chamber window dirt retention
  • Directional gas purge to reduce excimer discharge chamber window dirt retention

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Embodiment Construction

[0044] This specification discloses one or more embodiments that incorporate the features of this invention. The disclosed embodiment(s) are merely illustrative of the invention. The scope of the invention is not limited to the disclosed embodiment(s). The invention is defined by the appended claims.

[0045] The described embodiment(s) and references in the specification to "one embodiment," "an embodiment," "example embodiment," "exemplary embodiment," etc. indicate that the described embodiment may include a particular feature, structure or characteristic, but each embodiment may not necessarily include a particular feature, structure or characteristic. Moreover, these phrases are not necessarily referring to the same embodiment. Furthermore, when a particular feature, structure or characteristic is described in conjunction with one embodiment, it should be understood that it is within the knowledge of those skilled in the art to implement such feature, structure or char...

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PUM

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Abstract

A light source device includes a chamber and a metal fluoride trap coupled to the chamber and configured to provide a cleaning gas to a set of window housing devices coupled to the chamber. Each window housing device is configured to reduce metal fluoride fouling on the optical window and includes a window housing supporting the optical window, an aperture device coupled with the window housing, and an insert disposed between the aperture device and the optical window. The aperture device includes a plurality of cells configured to trap metal fluoride dust flowing upstream from the chamber through the aperture device toward the optical window. The insert is configured to control a first flow rate of the cleaning gas along the optical window and a second flow rate of the cleaning gas through the aperture device.

Description

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS [0002] This application claims priority to US Application No. 62 / 951,860, filed December 20, 2019, entitled "DIRECTED GAS PURGE TO REDUCEDUSTING OF EXCIMER DISCHARGE CHAMBER WINDOWS," the entire contents of which are incorporated herein by reference. technical field [0003] The present disclosure relates to window housing apparatus and systems, such as window housing apparatus and systems for reducing metal fluoride dust accumulation. Background technique [0004] A lithographic apparatus is a machine configured to apply a desired pattern to a substrate. Lithographic apparatuses can be used, for example, in the manufacture of integrated circuits (ICs). A lithographic apparatus may, for example, project a pattern of a patterning device (eg, mask, reticle) onto a layer of radiation-sensitive material (photoresist or simply "resist") provided on a substrate. [0005] To project a pattern on a substrate, a lithographic apparat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S3/034H01S3/225H01S3/036H01S3/08
CPCH01S3/225H01S3/0346H01S3/036H01S3/08072G03F7/70916G03F7/70933
Inventor J·T·梅尔基奥尔
Owner 西默有限公司