Check patentability & draft patents in minutes with Patsnap Eureka AI!

Wafer automatic alignment method

An automatic alignment and chip technology, which is applied in the direction of electrical components, manufacturing tools, stone processing tools, etc., can solve the problems of time-consuming, poor applicability, and increased cost of cutting machines

Inactive Publication Date: 2003-03-26
TRUTEK CORP
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Admittedly, this manual adjustment method cooperates with the auxiliary adjustment of the central processing unit 4 to achieve the purpose of aligning the wafer 101. However, this manual adjustment method needs to rely on the operator to visually observe the window 501 to complete. , and every time a chip is changed, it needs to be manually aligned again, so the speed is slow and time-consuming, so that the industry cannot effectively shorten the delivery time, and greatly affects the competitiveness of the industry
[0009] In order to solve the above-mentioned deficiency, Disco AbrasiveSystems, Ltd. (Disco AbrasiveSystems, Ltd.) introduces another cutting machine with double lenses. centimeter), by using the two lenses to take images at the same time, to shorten the time required for wafer alignment, but in actual use, because of the installation of two lenses, it will cause the overall cost of the cutting machine to increase , and if the size of the wafer to be cut is smaller than the gap, it cannot be applied, resulting in poor applicability

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wafer automatic alignment method
  • Wafer automatic alignment method
  • Wafer automatic alignment method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0028] A preferred embodiment of the method for automatic wafer alignment of the present invention is used in conjunction with the dicing machine 100, but this embodiment does not limit the application scope of the present invention. see Figure 9 , a wafer first placed on the cutting table 1 can be formed as a mother wafer 10, and a plurality of rectangular unit chips 11 that can be cut and separated are formed on the mother wafer 10, and the unit chips 11 have The two cutting directions x, y are arranged in an array, and a dicing lane 12 is spaced apart from each other. In the two cutting directions x and y, each unit chip 11 is respectively formed with a cutting distance D1 and D2 (the said The cutting distance D1 (D2) is equal to the length (width) of the unit chip 11 plus the width of the dicing road 12 ), and the lengths of the two cutting distances D1 and D2 are respectively equal to the center point of any two unit chips 11 The lengths of the distances D3 and D4, and ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The method is applicable to the cutting machine. With the master slice of water being aligned and collected by the manual adjustment manner, one group of the subsamples with least residue is selected through the zero adjustment, the sampling, the calculating residue of the spacing interval and the judgement procedures. The cutting worktable of the cutting machine is driven to rotate around the Z-axis, to shift along the X-axis as well as the camera of the cutting machine is shifted along the Y-axis. Thus, the subsequent other wafers can be automatically aligned through the said seven procedures.

Description

【Technical field】 [0001] The present invention relates to a method for wafer alignment, in particular to a method for automatic alignment of wafers which can be quickly and automatically aligned. 【Background technique】 [0002] Asia is now the key area of ​​the world's wafer foundry processing. However, with the increasingly fierce global competition, how to complete and deliver products to customers in the shortest time has become a very important issue. [0003] A conventional method for manually aligning wafers is to use with a wafer dicing machine 100. As shown in FIGS. 1, 2, and 3, the dicing machine 100 has: A self-rotating cutting table 1 for placing a wafer 101; a set of cutter shafts 2 and cameras 3 that can move back and forth along the Y-axis direction synchronously, and the cutter shaft 2 can move up and down along the Z-axis direction independently, and A blade 201 is provided; a central processing unit 4 that can control and drive the cutting table 1, the cutt...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B28D1/22H01L21/00H01L21/304
Inventor 徐秋田
Owner TRUTEK CORP
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More