Zero-Abbe error measuring system and its method

An error measurement, zero Abbe technology, applied in the field of measurement systems, can solve problems such as Abbe error, and achieve the effect of reducing cost and complexity

Inactive Publication Date: 2010-11-10
IND TECH RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The grating 120 is set under the mobile platform 100. This structure will also cause Abbe error because the positioning point and the actual measurement position fall in different positions.

Method used

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  • Zero-Abbe error measuring system and its method
  • Zero-Abbe error measuring system and its method
  • Zero-Abbe error measuring system and its method

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Embodiment Construction

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Abstract

A zero Abelian error measuring system is disclosed that includes: moving platform, detecting equipment, the first and second three-dimensional optical rulers. The moving platform is used to load the sample to be measured. The detecting equipment is used to detect the sample and measure the perpendicular height of observation point relative to sample. The first and second three-dimensional opticalrulers are mounted separately on the moving platform face to face secluded by the sample; the height of the first and second three-dimensional optical rulers can be adjusted tiny along the perpendicular height, the perpendicular height of the first and second three-dimensional optical rulers relative to the moving platform is same as the perpendicular height of observation point to measure the sample.

Description

Zero Abbe Error Measurement System and Method technical field The present invention relates to a measurement system and a method thereof, and in particular to a measurement system and a method thereof that can eliminate Abbe errors. Background technique The architecture of traditional 3D micro (nano) measurement systems, such as scanning probe microscopy (SPM), atomic force microscope (AFM) and coordinate measuring machine (CMM), etc., are mainly based on topography detection systems and / or Or the positioning platform and other subsystems. The main work of the topography detection system is to obtain the surface information of the object to be tested by means of probes and the like. The positioning platform system is responsible for pushing the probe carrier or the mobile platform, so that the whole system can complete the scanning and measurement in three dimensions. However, in such a positioning system, the placement position of the optical scale (linear scale) or the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01Q10/00G01B21/20G01Q40/00
Inventor 吴乾埼翁汉甫许正治王振宇温博浚
Owner IND TECH RES INST
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