34 results about "White light interferometry" patented technology

The invention relates to the technical field of optical detection, and particularly provides a white light interference signal demodulation method and device, a medium and a computer program product, and the method comprises the steps: processing interference light intensity signal data which are non-uniformly distributed on a wave number domain through non-uniform fast Fourier transform, and obtaining the frequency spectrum information of the interference light intensity signal data, determining a first optical path difference; analyzing the measurement resolution of the non-uniform fast Fourier transform, and if the measurement resolution is lower than a preset threshold value, constructing a to-be-measured optical path difference sequence within a preset accurate measurement range by taking the first optical path difference as a center; calculating the frequency spectrum amplitude of each to-be-measured optical path difference in the to-be-measured optical path difference sequence through non-uniform discrete Fourier transform, and obtaining the amplitude spectrum of the to-be-measured optical path difference sequence; and determining a second optical path difference according to the spectrum peak of the amplitude spectrum. According to the invention, through NUFFT coarse positioning and NUDFT local refinement, demodulation precision and efficiency are effectively balanced.

Method for producing a workpiece (64) made of quartz glass, which has at least one melt-polished workpiece surface (113) for use in a plasma-assisted manufacturing process, comprising the process steps: a) Providing a workpiece (64) made of quartz glass which has at least one raw surface (111) produced by cutting or machining, and b) Polishing the raw surface (111) to the polished workpiece surface (113) by laser polishing using at least one laser beam (81) moving relative to the raw surface (111), wherein the relative movement is generated by superimposing a translational-oscillating movement and a feed movement, wherein, as a result of the translational-oscillating movement, a quasi-line (87) is generated by a relative velocity between the raw surface (111) and the laser beam (81) above 500 mm / s, and wherein the feed movement has a relative velocity between the raw surface (111) and the laser beam (81) between 1 mm / s and 50 mm / s, c) and wherein a polished workpiece surface (113) is produced which has a micro-roughness and waviness, wherein the white light interferometry at a spatial wavelength λ OMicroroughness measured in the range of 1 µm to 10 µm has a surface roughness Sa of less than 0.5 nm, characterized in that the measurement is taken by means of a white light interferometer at a spatial wavelength in the range λ O Surface roughness (waviness) measured from 100 µm to 1000 µm has a value Sa of more than 5 nm, where the quasi-line (87) has a radiation intensity within the quasi-line (87) on the workpiece (64) between 10 W / cm² 2 and 1000 W / cm² 2 is produced wherein, for laser polishing of an annular end face (80) of a hollow cylindrical workpiece (64), the feed movement comprises rotation of the end face (80) about the longitudinal axis (84), and the translational-oscillating movement comprises a reversing movement of the laser beam (81) between an inner workpiece surface (85) and an outer workpiece surface (86), and wherein the speed of the translational-oscillating movement is set higher in the region of the inner surface (85) than in the region of the outer surface (86).

The application discloses a kind of parameter detection devices related to key component stress concentration coefficient, including base, image size measurement system, white light interferometry system and rotating table, using the detection method of parameter detection devices related to key component stress concentration coefficient, including the following steps: the image of notch sample is collected, the bottom surface microtopography point cloud of notch sample is collected, the structural stress concentration characteristic parameter size of notch sample is calculated, trend is leveled, the calculation of three-dimensional surface stress concentration characteristic parameter is carried out.The application belongs to the technical field of parameter related to stress concentration coefficient, specifically solves the function that existing technology cannot measure structural stress concentration characteristic parameter and surface stress concentration characteristic parameter simultaneously, needs manual test bar rotation, removes trend, and key information is easily lost in leveling process, so as to make measurement inaccurate, is a kind of new parameter detection device and detection method related to key component stress concentration coefficient.

The present invention addresses the problem of providing a technology capable of accurately measuring the film thickness of a thin film sample by using a white interference method. A scanning interference microscope according to the present invention calculates the film thickness of a sample on the basis of interference light generated by an interference objective lens, and a light source has spectral characteristics in which the Fourier transform of the wavelength spectrum of light entering the interference objective lens from the light source side becomes an exponential decay curve (see fig. 3).

Provided is a nozzle substrate configured by laminating a silicon substrate and a silicon oxide film covering a surface of the silicon substrate, and provided with a nozzle that discharges liquid, the nozzle substrate includes a through hole that penetrates the nozzle substrate and communicates with the nozzle, and a protective film that covers at least a surface of the silicon oxide film and an inner wall surface of the through hole and has resistance to the liquid, wherein a reflectance of white light on a surface of the nozzle substrate used in measuring the nozzle as a step by white light interferometry is 0.2 or more.

The application relates to the technical field of optical detection, and specifically provides a white light interference signal demodulation method, equipment, medium and computer program product. The method comprises the following steps: interference light intensity signal data which is non-uniformly distributed in a wave number domain is processed by using a non-uniform fast Fourier transform to obtain spectrum information of the interference light intensity signal data and determine a first optical path difference; the measurement resolution of the non-uniform fast Fourier transform is analyzed, if the measurement resolution is lower than a preset threshold, a to-be-measured optical path difference sequence is constructed in a preset fine measurement range with the first optical path difference as the center; the spectrum amplitude of each to-be-measured optical path difference in the to-be-measured optical path difference sequence is calculated by using a non-uniform discrete Fourier transform to obtain an amplitude spectrum of the to-be-measured optical path difference sequence; and a second optical path difference is determined according to the spectrum peak of the amplitude spectrum. The application effectively balances the demodulation accuracy and efficiency through NUFFT coarse positioning and NUDFT local fine adjustment.

The invention relates to the field of white light interference detection, in particular to a microarray lens white light interference detection system and method. The white light interferometer main body is used for generating and providing a white light interference detection light path; the voice coil motor driving module comprises a voice coil motor and a piezoelectric ceramic fine tuning sheet attached to the bottom of the voice coil motor and is used for driving the single-probe optical machine to perform scanning motion along the Z axis, and the single-probe optical machine is integrated with an interference objective lens of the white light interferometer main body; the multi-parameter detection module is used for synchronously acquiring displacement, load fluctuation and center-of-gravity shift data of the single-probe ray machine; the mechanical supporting module comprises an objective table used for bearing the microarray lens to be tested; and the intelligent control unit is in communication connection with the voice coil motor driving module, the multi-parameter detection module and the thermal management module, and is used for generating a driving current compensation amount in real time based on the synchronously acquired data so as to control the voice coil motor. The performance of efficient and high-precision white light interference detection on the microarray lens is improved.

The invention relates to a light beam attenuation coefficient measurement technology based on white light interference. A broadband spectrum light source, a color filter, an optical beam splitter, a measurement light path, a length-adjustable reference light path, a measured medium, a polarization beam splitter, an optical beam combiner, a polarization light switch, a photoelectric detector, a signal acquisition and processing unit, a control unit and a light switch control unit are included. The measurement of the light beam attenuation coefficient follows the white light interference technology, and the influence of background light and stray light is overcome. The polarization light switch is controlled to selectively output the horizontal polarization coherent light or the vertical polarization coherent light, and the horizontal polarization or vertical polarization beam attenuation coefficient of the measured medium can be obtained. The light beam attenuation coefficient of the wide-spectrum light source is measured, and the narrow-band band-stop optical filter is combined, so that the narrow-band spectrum light beam attenuation coefficient corresponding to the narrow-band band-stop optical filter can be obtained.

This invention discloses a method for obtaining the brittle-plastic transition depth of a two-phase composite material. The method involves using a metallographic microscope to capture a microscopic image of the scratch surface morphology. The locations of the first small pit and the first large pit in the scratch are determined from this image. Then, the distances from these two locations to the scratch incision point are measured using a measuring scale. The three-dimensional morphology of the scratch groove is obtained by photographing it using a white light interferometer. Based on the distances obtained from the measuring scale, the starting point (first small pit) and the ending point (first large pit) of the brittle-plastic transition zone are determined. The cross-sectional profile curve of the scratch at these locations is then captured, and the groove depth is measured. This invention combines the microscopic morphology captured by a microscope with the three-dimensional morphology obtained by white light interferometry to accurately determine the location and depth of the brittle-plastic transition in the material. This avoids interference from defects in the two-phase composite material itself or surface impurities and dust, effectively improving the accuracy of the test results.

The present disclosure relates to a surface profile measurement system and method. The surface profile measurement system comprises a displacement stage for carrying a reference sample and a sample and moving the reference sample and the sample. A white light interferometry module is configured to acquire a sequence of white light interference images at each measurement position on the surface of the sample to extract initial height data of different measurement points at each measurement position. A laser interferometry positioning module is configured to acquire a positioning interference image of the corresponding measurement position while the white light interferometry module acquires the sequence of white light interference images. A host computer is in signal connection with the displacement stage, the laser interferometry positioning module and the white light interferometry module, respectively. The host computer compensates the initial height data corresponding to the corresponding measurement points based on the positional offset of the positioning interference image of each measurement position relative to a reference interference image to obtain the height measurement value of each measurement point on the surface of the sample in the scanning direction, thereby eliminating the defocus error of the displacement stage.

The present invention discloses a fast white light interferometry in-situ measurement method based on grayscale-height mapping. Based on the principle of white light interferometry, the present invention scans a plane with the same material as the measured surface in a vertical direction before measurement, records interference images of different sampling heights, obtains a set of interference signals, aligns the interference coherence peaks and performs filtering and noise reduction processing to establish a grayscale-height mapping; during measurement, two interference images are collected at a specific interval, and the possible height point sets corresponding to the two sets of grayscales are found respectively. By finding the point with the smallest difference between the two sets of points, the reconstructed height of the corresponding pixel point is obtained; then, the pixel points with whole-cycle errors are filtered out by the height difference between adjacent pixel points, and reliable points are marked. The surface morphology of the microstructure is quickly reconstructed by interpolation of reliable points. The present invention can reduce the number of images required while maintaining the same accuracy as the scanning white light interferometry method, thereby greatly improving the measurement efficiency.

This invention claims protection for a three-dimensional reconstruction method for white light interferometry based on undersampling and Hilbert transform, comprising the following steps: selecting the sampling step size for undersampling according to the wavelength and bandwidth of the light source; acquiring the undersampled white light interferometry signal using a white light interferometer and performing Gaussian filtering; simulating the ideal white light interferometry signal according to the wavelength and bandwidth of the light source; performing Hilbert transform on the processed white light interferometry signal to obtain the envelope curve of the undersampled white light interferometry signal (i.e., the measured signal) and the envelope curve of the ideal white light interferometry signal (i.e., the ideal signal); normalizing the measured signal and the ideal signal to obtain the measured sequence and the ideal sequence; and performing sliding correlation calculation on the measured sequence and the ideal sequence to obtain the correlation coefficient r. s Find the correlation coefficient r s The maximum point is the maximum correlation point. Using the maximum correlation point as the starting point of the ideal signal, the ideal signal is replaced in the measured signal, and the envelope peak position of the measured signal is recalculated to solve for the height.

The utility model provides a white light interference detection device for on-machine detection, comprising an adjusting mechanism which comprises a transverse adjusting table sliding left and right, a longitudinal adjusting table sliding up and down, and a two-dimensional radian adjusting table used for adjusting the horizontal inclination and angle, the transverse adjusting table is fixedly installed on the front side of the longitudinal adjusting table, and the longitudinal adjusting table is fixedly connected with the two-dimensional radian adjusting table through a connecting plate. The optical detection device is fixedly installed above the two-dimensional radian adjusting table, one side of the tool rest connecting piece is fixedly connected with the front side of the transverse adjusting table, and the other side of the tool rest connecting piece is fixedly connected with a tool rest of the numerical control machine tool. According to the utility model, the detection device is directly arranged in a processing environment, and the position of the detection device is adjusted through the adjusting mechanism, so that on-machine detection in production is realized, the processing fixing position of a product is not influenced by detection, parts do not need to be disassembled, and the production detection efficiency is improved.

This invention discloses a method and system for undersampling fly-scan 3D surface reconstruction based on white light interferometry. The method includes: firstly, acquiring continuous fly-scan undersampling signals; secondly, preprocessing the signals and constructing an effective pixel sample set; and finally, using a position-guided undersampling interferometric reconstruction model to perform height reconstruction, thereby generating a complete 3D surface height map. This invention significantly improves reconstruction accuracy and adaptability to complex surfaces, and can be widely applied in fields such as semiconductor testing, precision optical measurement, and 3D reconstruction of industrial microstructures, especially suitable for complex application scenarios requiring rapid measurement of large-depth samples.

The invention relates to a method for determining a height map of a surface of a sample by white light interferometry, wherein a white light interferometer with a broadband light source and an optical sensor comprising pixels is used. The invention also relates to a white light interferometer comprising a broadband light source, an optical sensor comprising pixels and a processor configured to perform the method of the invention. The invention also relates to a digital data carrier comprising a computer program which, when executed on a processor of a white light interferometer according to the invention, causes the white light interferometer to execute the method according to the invention.

The invention relates to a volume scattering function measurement technology based on white light interference. A broadband spectrum light source, a color filter, an optical beam splitter, a measurement light path, a length-adjustable reference light path, a measured medium, a polarization beam splitter, an optical beam combiner, a polarization light switch, a photoelectric detector, a signal acquisition and processing unit, a control unit, a reference arm length adjusting unit and a light switch control unit are included. According to the definition of a volume scattering function, a single sensor can be adopted to measure volume scattering intensities at different angles in sequence along a circular trajectory; a plurality of sensors can also be adopted and arranged along a circular trajectory to measure volume scattering intensities at different angles. The measurement of the volume scattering function follows the white light interference technology, and the influence of background light and stray light is overcome. The polarized light switch is controlled to selectively output the horizontal polarization coherent light or the vertical polarization coherent light, and the horizontal polarization or vertical polarization body scattering function of the measured medium can be obtained. A narrow-band spectrum volume scattering function corresponding to a narrow-band band-stop optical filter can be obtained by measuring the volume scattering function of the wide-spectrum light source and combining the narrow-band band-stop optical filter.

The invention discloses a device, a method and a system for rapidly measuring the three-dimensional shape of a micro-lens array, and belongs to the technical field of micro-lens array measurement. According to the invention, efficient and accurate measurement and batch analysis of the three-dimensional morphology of the micro-lens array are realized by using the white light interference measuring head, the XYZ three-axis displacement table, the control processing equipment, and a built-in three-point positioning algorithm, a path planning algorithm, an automatic measurement and analysis algorithm and the like, the measurement result can be visually displayed, and a final report can be generated.

The invention discloses a light beam attenuation coefficient measurement technology based on a reflected light path. A spectrum light source, a color filter, an optical beam splitter, an optical circulator, a measurement light path, a length-adjustable reference light path, a measured medium, a polarization beam splitter, an optical beam combiner, a polarization light switch, a photoelectric detector, a signal acquisition and processing unit, a control unit and an optical switch control unit are adopted. The measurement of the light beam attenuation coefficient follows the white light interference technology, and the influence of background light and stray light is overcome. The polarization light switch is controlled to selectively output the horizontal polarization coherent light or the vertical polarization coherent light, and the horizontal polarization or vertical polarization beam attenuation coefficient of the measured medium can be obtained. The light beam attenuation coefficient of the wide-spectrum light source is measured, and the narrow-band band-stop optical filter is combined, so that the narrow-band spectrum light beam attenuation coefficient corresponding to the narrow-band band-stop optical filter can be obtained.

The present disclosure describes a kind of measuring device for the center wavelength of light source of white light interference microscope, including generation module, interference objective, sampling module and data processing module;Generation module is used to emit measurement beam to the sample to be measured via interference objective, and the reflected light beam is formed in interference objective after measurement beam is reflected on the sample to be measured;Sampling module acquires reflected light beam to obtain optical interference signal for forming multiple frame images about the sample to be measured;Data processing module is used to: construct the relationship curve of signal intensity of optical interference signal and the sampling frame number of multiple frame images;And the fitting slope of image frame sequence of multiple frame images and the phase of relationship curve at each frame image is obtained, and the center wavelength of light source is obtained according to fitting slope.It can directly measure the center wavelength of white light source on the measuring device, and the efficiency and convenience of measurement can be improved.

The present invention discloses a device for measuring distributed optical polarization crosstalk over an ultra-wide spectral range. The device includes an ultra-wideband light source module, an optical path modulation and demodulation module, a signal detection and processing module, and a device under test. The ultra-wideband light source module provides input optical signals with different central wavelengths, which are injected into and emitted from the device under test at both ends. After passing through the ultra-wideband light source module, these signals are received by the optical path modulation and demodulation module. Based on the principle of white light interferometry, the device simultaneously obtains and converts ultra-wideband white light interference signals into electrical signals by adjusting the optical path difference of the optical path modulation and demodulation modules. The signal detection and processing module calculates the ultra-wideband polarization characteristics of the device under test corresponding to the ultra-wideband light source module based on the electrical signals. This device can effectively broaden the measurement wavelength range of distributed polarization crosstalk in optical devices, effectively improve measurement efficiency, and reduce measurement device costs.

The present application belongs to the field of novel display jet printing manufacturing, and particularly relates to a white light interference detection method for film morphology in novel display jet printing manufacturing, which comprises: obtaining a series of white light scanning interference images of a to-be-detected region; adaptively determining whether the to-be-detected region is a film region or an edge region by using an apex angle method; for the film region, constructing discrete points by using a series of light intensity contrasts of each pixel point and a series of image acquisition heights, performing envelope extraction and Gaussian fitting, determining the image acquisition height of a double-peak in the fitting signal of the corresponding pixel point, and calculating the absolute film thickness at the corresponding pixel point; for the edge region, adaptively dividing a film area and a substrate area based on envelope extraction and Gaussian fitting, using the image acquisition height of the higher peak in the fitting signal of each pixel point in the film area and the image acquisition height of the single peak in the fitting signal of a certain pixel point on the substrate, and calculating the relative film thickness of the corresponding pixel point in the film area. The method can adaptively realize accurate morphology reconstruction of different film regions.

The application discloses a white light interference measurement method and system for compensating surface micro topography, and relates to the technical field of interference measurement. An original sequence image of white light interference of a component surface is acquired; a determination threshold of measurable points and unmeasurable points is acquired according to a standard step surface; the original sequence image is used to generate an ultra-depth two-dimensional image and height point cloud data at the same time; the ultra-depth two-dimensional image and the height point cloud data are used to generate measurable point cloud data with color information; color information is segmented and positioned to obtain position data, quantity data and height data of defects or attachments; a variable spline interpolation calculation is performed based on the measurable points adjacent to the unmeasurable points to obtain a prediction result of the unmeasurable points; and three-dimensional topography of the component surface is obtained according to the prediction result of the unmeasurable points and the measurable point cloud data. The application realizes identification of real defects and attachment information of the component surface, compensates for distortion information of unmeasurable points of the component surface, and improves the accuracy of evaluation of the component surface topography.

The application provides a white light interferometry system, comprising a probe module, wherein the probe module is provided with a first probe and a second probe; the number of the second probes is multiple, and the multiple second probes are distributed on the circumferential side of the first probe; the first probe is used for emitting first detection light along the axial direction of the first probe and receiving reflected first detection light; the second probe is used for emitting second detection light outward along the radial direction of the second probe and receiving reflected second detection light; the probe module is used for acquiring the brightest peak of interference of the first detection light and the second detection light in one micro scanning process; the first probe is used for acquiring the measuring point information of the side surface of the object or the bottom of the groove; and the second probe is used for acquiring the measuring point information of the side wall of the object or the groove wall. The first probe and the second probe can be used to simultaneously or sequentially measure the top surface, the bottom surface and the 360-degree side wall of the workpiece in one clamping, the measuring efficiency is improved by several times, and the probe, the inclined measuring seat or the workpiece need not be frequently replaced or turned over for multiple times.

The invention discloses a metal surface thin liquid film measurement and three-dimensional modeling test device and a use method thereof, and belongs to the field of metal material surface monitoring and corrosion control, and the device comprises a reflective alignment calibration system used for adjusting the perpendicularity of a measurement spectrum probe and a metal substrate; the white light interference measurement system is used for measuring the thickness of the liquid film on the metal surface in a non-contact manner; the programmable three-axis stepping plane scanner is used for driving the white light interference measurement system to move in a three-dimensional space and dynamically adjusting the position of a probe based on measurement data; the corrosion protection device is used for protecting the white light interference measurement system and the programmable three-axis stepping plane scanner from environmental corrosion; and the experimental data monitoring and three-dimensional modeling system is used for receiving the measurement data and generating a three-dimensional model of the liquid film thickness. According to the invention, long-time reliable observation of the thickness of the liquid film in a complex environment is facilitated.

The invention discloses a machine learning-based white light interference scanning nonlinear error compensation method. The method comprises the following steps of: acquiring original scanning data of a white light interference measurement system and pre-processing the original scanning data; performing time alignment processing to obtain an alignment scanning data set; performing sliding segmentation, and extracting time domain features, frequency domain features and statistical features to form a feature vector set; forming non-linear error label data, and combining the non-linear error label data with the feature vector set to form a training sample set; the improved SINDy model is trained, and a trained improved SINDy model is obtained; collecting an interference intensity sequence and a scanning displacement sequence of a to-be-detected sample in real time, and generating a corresponding to-be-detected feature vector; outputting a corresponding nonlinear error compensation amount; the white light interference scanning measurement result is formed, effective compensation of complex nonlinear errors in the white light interference scanning process is achieved, and the precision and reliability of the measurement result are improved.

The application discloses a white light interference detection and multiplexing system and method with a flying strain resolution order of magnitude, utilizes the feature that the coherence length of white light is small, adjusts the fiber delay parameter, makes the multiple reflection light in the fiber grating group and the first reflection light perform heterodyne interference, realizes the effect of improving the system phase change and sensitivity, simultaneously adds the interferometer, demodulates the low-order interference light result as the reference of the high-order interference light, reduces the overall noise floor of the system, and finally fully utilizes the advantages of the white light spectrum width and the wavelength selectivity of the fiber grating, realizes the multiplexing, high resolution and low cost large-scale array sensing on one or more optical fibers.

This invention provides a method for reconstructing complex surfaces based on white light interferometry data: The method acquires surface topography measurement data of the complex surface to be reconstructed using white light interferometry; constructs a sliding local region centered on each point to be estimated within the measurement area; processes the measurement data within each local region to obtain the height value of the corresponding point to be estimated; and outputs the global reconstruction result of the complex surface after traversing all points to be estimated across the entire region. The process of processing the measurement data within each local region includes the following steps: S1, using MM estimation to perform robust pre-estimation of the measurement data within the current local region; S2, using the absolute value of the residual as input, and through mixing... t Distribution clustering adaptively classifies the measurement data to obtain the retained valid measurement data; S3, repeat S1 to S2 until the outlier removal iteration is completed to obtain the final valid measurement dataset; S4, use weighted Jacobi basis functions to perform local regression to obtain the height value of the point to be estimated.

The present invention discloses a device and method for improving the sampling rate of white light interference based on automatic tracking. The device is composed of a broadband light source, a reference arm, a measuring arm, a fiber coupler, a motion control unit, and a signal receiving and processing module. The method of the present invention first uses a linear displacement stage to find the equal optical path point and then stops the movement. Then the piezoelectric scanning stage starts working and continuously measures the surface of the sample to be measured. By setting an automatic tracking threshold, when the threshold is exceeded, the linear displacement stage moves to a new center stripe position, so that the center stripe position is again near the middle zero position of the piezoelectric scanning stage, and finally completes the automatic tracking. The method of the present invention will not cause the piezoelectric scanning stage to be unable to find the equal optical path point due to the fluctuation of the surface to be measured. The present invention can realize automatic tracking measurement of unknown surfaces without setting a measurement path and unknown measured surface information, and utilizes the high-frequency scanning characteristics of the piezoelectric scanning stage to improve the sampling rate and measurement speed.

Disclosed herein is an apparatus and method for measuring the accumulation-aggregation mass of an analyte in a crowded bioorganic material context by measuring a spatial mass distribution profile using a high frequency recognition pattern. The recognition pattern allows for Fourier filtering of quality sensitive image data for background and noise deduction. The devices and methods enable screening of biological fluid samples for analytes associated with proteinopathies.