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Grating and clean room system comprising the same

a technology of grating and clean room, which is applied in the field of clean room, can solve the problems of high operating cost of running the air conditioning system of the clean room system to provide such a high differential pressure and airflow velocity, and achieve the effect of facilitating smooth and/or rapid discharging of air from the clean room

Inactive Publication Date: 2006-01-05
SAMSUNG ELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention provides a grate for a clean room that allows air to be smoothly and quickly discharged without the need for expensive air conditioning. The grate has a base plate with holes that act as nozzles through which air is discharged. The grate also has a cross-sectional area that decreases and then increases in a direction from the top to the bottom, which helps to minimize eddies in the air and prevents contaminants from being blown upwardly. The grate may also include a tile made of polyvinyl chloride at the top. Overall, the invention provides a cost-effective solution for clean room systems.

Problems solved by technology

However, unlike micro-particles, molecular contaminants in the air of the clean room, referred to as nanoparticles, and airborne molecular contamination (AMC) are not easily removed.
Needless to say, the operating costs of running the air conditioning system of the clean room system to provide such a high differential pressure and airflow velocity are very high.
Also, a conventional clean room system that is capable of producing the differential pressure and airflow velocity required for the removal nanoparticles and AMC is very expensive to manufacture.
As a result, the air is contaminated at the level at which the processes in the clean room are carried out.

Method used

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  • Grating and clean room system comprising the same
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  • Grating and clean room system comprising the same

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Embodiment Construction

[0031] Hereinafter, the present invention will be described in more detail with reference to FIGS. 3 to 11. Like reference numerals are used to designate like elements throughout the drawings.

[0032] Referring first to FIG. 3, a clean room system 100 includes a clean room, an air supplying portion and an air exhausting portion. The air supplying portion includes a fan filter unit 120 provided in the ceiling of the clean room 110. The fan filter unit 120 includes a filter and a fan integrated as a unit so as to supply filtered air into the clean room. Although not shown, a ceiling filter, such as a high efficiency particulate air (HEPA) filter or an ultra low penetration air (ULPA) filter, may be provided in the ceiling of the clean room for removing from the air foreign particles, such as dust, whose average diameter is on the order of several microns.

[0033] The air passes through the fan filter unit 120 and into the clean room 110 where the air forms a vertical current. Such a ver...

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PUM

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Abstract

Grating forming the floor of a clean room minimizes turbulence and enhances the rate at which air is discharged therethrough. The grate includes a base plate having a plurality of through-holes. Each of the through-holes includes a receiving portion through which the air is received and an exhausting portion through which the air is exhausted. The cross-sectional area of the receiving decreases toward the exhausting portion, and the cross-sectional area of the exhausting portion decreases toward the receiving portion.

Description

BACKGROUND OF THE INVENTION [0001] 1. Field of the Invention [0002] The present invention relates to a clean room such as that in which semiconductor devices and liquid crystal displays (LCD) are manufactured. More particularly, the present invention relates to the grating that forms a floor of a clean room system. [0003] 2. Description of the Related Art [0004] Semiconductor devices and liquid crystal displays (LCD) must be manufactured under very precise processing conditions. Therefore, they are fabricated in extremely clean environments unlike many common products of manufacture. In this respect, several semiconductor processing apparatuses are typically provided in separate clean rooms in which the environments are maintained so as to be extremely clean. [0005] In a clean room, technicians work in special dustproof clothes in order to minimize the production of foreign substances such as dust. Also, the upper portion of the clean room is maintained at a pressure slightly higher...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): F24F7/007
CPCF24F13/068F24F3/161F24F3/167H01L21/02
Inventor HWANG, JUNG-SUNGCHO, CHANG-MINYANG, JAE-HYUNCHON, SANG-MUNKIM, JAE-BONG
Owner SAMSUNG ELECTRONICS CO LTD