Imprinted micro-louver structure

Abstract

A micro-louver structure includes a cured layer on a surface. A plurality of micro-channels forms a pattern in the cured layer. The micro-channels have a greater depth than width and are spaced apart by a separation distance greater than the width. A cured light-absorbing material is located in the micro-channels.

Description

CROSS REFERENCE TO RELATED APPLICATION[0001]Reference is made to commonly-assigned U.S. patent application Ser. No. ______ filed concurrently herewith, entitled “Imprinted Micro-Louver Structure Method” by Ronald S. Cok, the disclosure of which is incorporated herein.FIELD OF THE INVENTION[0002]The present invention relates to micro-louver structures.BACKGROUND OF THE INVENTION[0003]Micro-louver structures are widely used for privacy screens to inhibit display viewing at large angles from an angle orthogonal to the display. Micro-louver structures are also useful for rejecting specular illumination of a surface at large angles from an angle orthogonal to the surface. For example, U.S. Pat. No. 5,543,870 describes a rear-projection screen with two crossed films of micro-louver light control material to provide a high degree of blocking of high-intensity light, such as sunlight that can impinge upon the front of the screen. U.S. Patent Application Publication 20090242142 describes a v...

AI Technical Summary

Benefits of technology

The patent is about improving the viewing angle, weight, thickness, and cost of micro-louver structures and manufacturing methods. The improvements can be achieved through reduced micro-louver thickness and fewer layers, increased micro-louver depth, and a roll-to-roll manufacturing process. These improvements make the micro-louver sheets useful as privacy screens for display systems. Additionally, the patent also discusses reducing reflectivity and improving the contrast of the micro-louver sheets, as well as inhibiting or restricting display viewing angle.

Problems solved by technology

These methods are limited in the depth they can achieve since photo-lithographic etching has a practical depth limitation or the patterns available are limited to those that can support etching.

Furthermore, photo-lithographic processes are relatively expensive and slow.

It is also difficult to make large micro-louver sheets 12 since it is difficult to cut large, thin sheets, for example using skiving.

Furthermore, such sheets typically need additional processing to remove curl and polish the edges.

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