95results about How to "Flow adjustment" patented technology

The invention relates to the field of auxiliary devices for light aircrafts, and particularly discloses a lifting platform for assembling a light aircraft. The lifting platform comprises a supportingbottom plate and a supporting top plate; a folding telescopic rack and stable telescopic rods are separately arrange between the supporting bottom plate and the supporting top plate; an adjusting sleeve and a lifting motor used for driving the adjusting sleeve to rotate are separately arranged at the top of the supporting bottom plate; the adjusting sleeve is arranged at the middle part of the supporting bottom plate; a positioning screw rod is in threaded connection with an inner cavity of the adjusting sleeve in a sliding manner; the top of the positioning screw rod is connected with a supporting shaft at the top of the folding telescopic rack; each stable telescopic rod comprises an inner rod and an outer sleeve; the bottom ends of the inner rods are fixedly connected onto the top surface of the supporting bottom plate; the top ends of the outer sleeves are fixedly connected onto the bottom surface of the supporting top plate; and the inner rods coaxially extend into the outer sleeves corresponding to the inner rods and can move axially. An accessory or a tool not to be carried can be sent onto the platform, so that the working efficiency is improved, and meanwhile, the output torque of the lifting motor can be improved.

The invention discloses a novel hydraulic engineering energy dissipater structure, and relates to the field of hydraulic engineering energy dissipation. The structure comprises a drainage face and a stilling pool arranged at the bottom end of the drainage face, a plurality of toe piers are arranged at the joint between the drainage face and the stilling pool, and an end sill is fixedly connected to the tail end of the stilling pool. A plurality of baffle piers are fixedly connected with the interior of the stilling pool, a water through groove where water can pass is reserved between every twoadjacent baffle piers, and baffle blocks are arranged in the water through grooves, located between the adjacent baffle piers and rotationally connected with the baffle piers. The rotary connection positions between the baffle blocks and the baffle piers are located at the positions close to the top ends of the baffle blocks. Water flows into the stilling pool, the baffle piers in the stilling pool block water, and therefore secondary consumption is carried out on water. The baffle blocks are rotationally connected with the baffle piers, water jacks open the baffle blocks and flows into the end sill through the water through grooves, water energy consumption can be increased since water jacks open the baffle blocks, and therefore water impact energy is reduced.

The invention relates to a device for preparing a fully deposited silicon carbide coating by chemical vapor deposition, and belongs to the technical field of silicon carbide coating preparation. According to the main technical scheme, the device for preparing the fully deposited silicon carbide coating by the chemical vapor deposition includes a cavity, a support ring, gas flow interfering bodiesand supporting members. An air inlet device is arranged at the top of the cavity, and an air outlet device is arranged at the bottom of the cavity. The outer side wall of the support ring is connectedto the inner wall of the cavity, and the cavity is divided into an upper cavity and a lower cavity which communicate with each other in the middle. One ends of the gas flow interfering bodies are disposed on the support ring and arranged in the direction from the support ring to the top of the cavity, and the number of gas flow interfering bodies is greater than or equal to three. The supportingmembers are disposed at the bottom of the cavity for supporting a sample of a coating to be deposited and the sample is located in the lower cavity. The device for preparing the fully deposited silicon carbide coating by the chemical vapor deposition is capable of obtaining the fully deposited silicon carbide coating on the surface of the sample.

The invention discloses a solid precursor source sublimation device and method for semiconductor processing, aiming to solve the problems of unstable volatilization and sublimation of the solid precursor source and low utilization rate of the solid precursor source. The invention includes a storage box, several trays installed in the storage box, an electric heating temperature control plate installed at the bottom of the tray, and a number of storage tanks for loading solid-state precursor sources are densely covered on the tray, and the storage boxes form a serpentine ventilation flow The storage box is provided with a carrier gas inlet and a mixed steam outlet, and the two ends of the air flow channel are respectively connected with the carrier gas inlet and the mixed steam outlet. This electrothermal solid-state precursor source storage and sublimation device can provide uniform and stable thermal energy for the volatilization and sublimation of the solid-state precursor source, and prevent the formation of low-resistance channels. The source can still be used, and the utilization rate of the solid precursor source is improved while providing a stable concentration of the solid precursor source vapor.