Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Artifact correction method based on even marker in plane echo imaging technique

A technology of echo planes and markers, applied in diagnostic recording/measurement, measurement using nuclear magnetic resonance imaging systems, medical science, etc., can solve poor artifact correction effects, low signal-to-noise ratio of EPI sequence images, reliability and Reduced practicability and other issues, to achieve the effect of excellent reliability and applicability, and high anti-noise performance

Inactive Publication Date: 2008-08-13
SOUTHEAST UNIV
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Artifact correction is poor when the signal-to-noise ratio is low
[0018] In fact, in order to improve the time resolution of fMRI, the EPI imaging field of view is small, resulting in a large overlap between the target image and the artifact, and the signal-to-noise ratio of the EPI sequence images is low
In this case, the limitations of the phase correction method reduce its reliability and practicability. Therefore, more effective ghost artifact correction methods need to be further studied

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Artifact correction method based on even marker in plane echo imaging technique
  • Artifact correction method based on even marker in plane echo imaging technique
  • Artifact correction method based on even marker in plane echo imaging technique

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment approach

[0064] In order to verify the proposed method of correcting ghost artifacts in echo planar imaging technology based on uniform markers, we still use the Shepp-Logon brain model to conduct EPI simulation experiments. The specific implementation methods are as follows:

[0065] 1) at Figure 1-A In the Shepp-Logon brain model image shown with a matrix size of 128×128, the left border is used as the starting position, and the superimposed matrix size is 10×20 at the center of the background area on the left side of the image, and the gray value is Shepp- Uniform rectangular blocks of Logon image mean to simulate homogeneous markers with high signal intensity, the results are as follows Figure 3-A shown;

[0066] 2 pairs Figure 3-ATwo-dimensional Fourier transform is performed to obtain ideal k-space data. In order to simulate the fixed phase error and linear phase error caused by factors such as static magnetic field inhomogeneity and echo center offset in the process of EPI ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a ghost false-shadow method of echo plane imaging technique based on even marking object, which is characterized by the following: placing a magnetic sensitive marker on the left side of imaging view field out of rectangle region; proceeding magnetic resonance imaging of marker and object; transmitting two-dimensional inversed Fuliye operation through placing 0; proceeding time inversing operation of image rebuilding or placing 0 and two-dimensional inversed Fuliye transmission; obtaining two plural images; calculating the even phase difference of each row of pixel in two plural image marking regions; fitting the even phase difference through higher-order polynomial; estimating the even phase difference out of the marker region; correcting the image phase; adding; obtaining the magnetic resonance image of ghost false-shadow. The invention improves the noise-proof property, which is convenient to operate.

Description

technical field [0001] The invention belongs to the field of artifact correction of magnetic resonance imaging technology, and in particular relates to a method for correcting ghost artifacts in echo plane imaging technology based on uniform markers. Background technique [0002] Echo planar imaging (EPI) collects odd and even echo signals in k-space based on frequency readout gradients in opposite directions, and can obtain images of the entire brain within a few seconds. (magnet resonance imaging, MRI) is a widely used rapid scanning technique. However, factors such as magnetic susceptibility differences between internal tissues of imaging objects, chemical shifts, static magnetic field inhomogeneity, gradient eddy currents, and imperfect system hardware performance lead to phase errors between odd and even echoes in k-space. This kind of phase error causes the images reconstructed by two-dimensional inverse Fourier transform to have obvious ghost artifacts (ghost artifac...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): A61B5/055G01R33/48
Inventor 王世杰罗立民李松毅
Owner SOUTHEAST UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com