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Processing apparatus for basal plate transmission

A technology for processing devices and substrates, applied in transportation and packaging, devices for coating liquid on the surface, conveyor objects, etc., can solve the problems of increasing the number of stations and unfavorable space utilization, etc., to shorten the processing time and reduce the size of the device the effect of

Inactive Publication Date: 2008-11-05
TOKYO OHKA KOGYO CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the number of workstations is increased, so it is not conducive to space utilization

Method used

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  • Processing apparatus for basal plate transmission
  • Processing apparatus for basal plate transmission
  • Processing apparatus for basal plate transmission

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] Embodiments of the present invention will be described below based on the drawings.

[0025] figure 1 It is an overall plan view showing one embodiment of the substrate transport processing apparatus of the present invention, figure 2 is a perspective view of the positioning station, image 3 It is a partially enlarged top view of the transport fork, Figure 4 yes image 3 A view from direction A-A.

[0026] Such as figure 1 As shown, the substrate conveying and processing apparatus 1 of this embodiment is configured as follows: a standby station S1, a positioning station S2, a rotating station S3, a decompression drying station S4, and an edge cleaning station are installed from the right side of the paper. S5.

[0027] exist figure 1 In this substrate transport processing apparatus 1, the substrate W is transported from the right side to the left side of the paper.

[0028] Guide rails 2 and 3 are provided in the transport processing device 1 , and a transpor...

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PUM

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Abstract

The present invention provides a substrate conveying and treating device capable of carrying out coating procedure during the substrate is conveyed. The substrate conveying and treating device feeds the standby substrate(W)in the standby station(S1)to the positioning station(S2)by conveying fork(4) and feeds the substrate(W)positioned in the positioning station(S2)to the rotating station(S3)by conveying fork(5), and then, supplying coating liquid from the nozzle(58)of the conveying fork(5)to the surface of the substrate(W)during the conveying from the positioning station(S2)to the rotating station(S3).

Description

technical field [0001] The present invention relates to a transport processing device for transporting substrates such as glass substrates and semiconductor wafers between stations performing various processes. Background technique [0002] As a method of coating various coating liquids such as resist liquid or SOG on the surface of a substrate such as a glass substrate or a semiconductor wafer, it is generally used to drop the coating liquid to the center of the substrate, and then rotate the substrate to make the dripping liquid drip by centrifugal force. A spin coating method (so-called spin coating) in which the coating liquid in the center spreads over the entire surface of the substrate. [0003] As the above-mentioned spin coating, Patent Document 1 discloses a method in which a coating and rotation station is arranged next to an alignment station, and coating and rotation are performed at the same station. [0004] In addition, Patent Document 2 discloses a method i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B05C13/02C03C17/00H01L21/677
Inventor 熊泽博嗣
Owner TOKYO OHKA KOGYO CO LTD