Insertion layer for thick film electroluminescent displays
A display and electroluminescence technology applied in the field of non-porous layers
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example 1
[0051] The production is usually like image 3 Electroluminescent element of the type shown.
[0052] An electroluminescent element was formed on an alumina substrate of 5 cm×5 cm. In the use of PMN-PT paste from North Adams MRA, MA, USA 98-42 or from W Heraeus CL-90-7239 printed and fired composite dielectric layer including thick film dielectric layer screen After that, the original thick film structure including the gold conductor is deposited on the substrate, and the gold conductor is patterned to form a lower electrode connected to the contact. Then, a double-layer lead zinc titanate (PZT) is deposited on the substrate by using an organometallic deposition method and firing spin coating. This method is described in the aforementioned PCT patent application WO00 / 70917.
[0053] The following process was used to deposit a barium titanate layer on the PXT layer on the thick film substrate. A barium titanate sol suspension (0.5M) in methoxypropanol was obtained from Gelest, Tull...
example II
[0061] In addition to using a paste with PMN-PT from Ferro Corporation Niagara Falls, USA for the thick film structure instead of MRA paste and using strontium sulfide activated by cerium with a cerium concentration of 0.3 atomic percent instead of the magnesium zinc sulfide phosphor Outside the film, an electroluminescence element similar to that of Example I was fabricated. Also make Al with a thickness of 50 nanometers 2 O 3 Layer instead of barium titanate layer.
[0062] The result is shown in Figure 5.
[0063] With 50 nm thick Al 2 O 3 Compared to a comparative device with a layer of barium titanate instead of a barium titanate layer, the test results on the device of the present invention with barium titanate showed improved brightness at 260 volts and 120 Hz. In addition, the brightness higher than the threshold voltage is linear with the voltage used for the device of the present invention, and as the voltage for the device without a barium titanate layer increases, the ...
example III
[0065] The phosphor-free film is a 150-nanometer thick film of europium-activated barium thioaluminate deposited according to the method disclosed in the US Provisional Patent Application Serial No. 60 / 232549 filed on December 14, 2000. Similar implementations are produced. The electroluminescent element of Example II. The barium thioaluminate phosphor is a blue-emitting phosphor. Also made 200nm thick Al instead of barium titanate layer 2 O 3 Layer comparison device.
[0066] The measurement results are shown in Figure 6.
[0067] At 250 volts and 120 Hz, the measured brightness of the device of the present invention with a barium titanate layer is about 80 Canvas per square meter. Under the same test conditions, it is used to replace the barium titanate layer with 200nm thick Al 2 O 3 The brightness of the comparison device of the layer is about 10 Canvas per square meter.
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