Process for manufacturing optical and semiconductor elements
一种半导体、元件的技术,应用在成形元件的阵列领域
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[0012] Figures 1a and 1b illustrate representative embodiments of patterned abrasives 10, 30 for abrading a substrate material to form an array of individual optical and / or semiconductor elements. Grinding, as used herein, can include simultaneously grinding and polishing a substrate material, however, polishing can also be performed as a separate step. In addition, "separate" and "singulated" as used herein with respect to an element or shaped element means that the element is an identifiable unit, but not necessarily separated from other elements. Likewise, "singulating" refers to the formation of identifiable units, which need not necessarily be separated from each other. As shown, the patterned abrasive 10 , 30 includes a working surface 12 , 32 and a backing 14 , 34 . The working surface 12 , 32 includes protrusions 16 , 36 , particles 18 , 38 and binder 20 , 40 .
[0013] The patterned abrasive 10,30 is formed by applying to a backing 14,34 a composition of particles 1...
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