Device for preparing nano granule by twice coulomb fissions

Abstract

The invention discloses a device for preparing nanoparticles by secondary coulombic fission, which comprises: (a) a feeding device; (b) a quartz capillary, one end of which is provided with a capillary that is internally provided with a tungsten electrode and is embedded with a nozzle at the bottom end; (c) a vacuum cavity, the interior of the vacuum cavity which is arranged at the lower part of the nozzle of the quartz capillary is sequentially provided with a charging polar plate, a baffle plate and a particle cooling and collection device which are connected with a power supply by guide wires; the device also includes (d) a microcomputer control system; (e) a frequency flasher and a camera device, which are respectively connected with the microcomputer control system. The device of theinvention for preparing the nanoparticles by the secondary coulombic fission has strong process controllability; the flow rate of melt (liquid) and the voltage between the quartz capillary and the polar plate can be controlled, the micro-particles with even size can be obtained by utilizing an image surveillance system and a loop feedback control system, the process flow is short, the product quality is good and the equipment investment is greatly reduced.

Description

technical field [0001] The invention relates to a device for preparing nanoparticles, in particular to a device for preparing nanoparticles by secondary Coulomb splitting. Background technique [0002] According to the Rayleigh instability principle, when the ratio of the surface charge disturbance to the surface tension of the liquid exceeds the Rayleigh limit, the liquid will undergo spontaneous Coulomb splitting. [0003] The current traditional particle preparation technologies, such as gas atomization, vibration granulation, etc., produce particle sizes in the micron or submicron range, and the particle size distribution is not uniform. The uniform droplet injection technology that emerged in the early 1990s can produce uniform alloy particles, but due to jet stability and process limitations, it is difficult to produce particles below the micron level. Contents of the invention [0004] The purpose of the present invention is to provide a short-flow, high-efficiency...

AI Technical Summary

Problems solved by technology

[0003] The current traditional particle preparation technologies, such as gas atomization, vibration granulation, etc., produce particle sizes in the micron or submicron range, and the particle size distribution is not uniform

The uniform droplet injection technology that emerged in the early 1990s can produce uniform alloy particles, but due to jet stability and process limitations, it is difficult to produce particles below the micron level

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