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Off-centering quantity measuring apparatus

A technology for measuring devices and eccentricity, which is applied to measuring devices, adopting optical devices, and testing optical properties, etc., to prevent the reduction of measurement accuracy and shorten the required time.

Inactive Publication Date: 2010-09-29
FUJI PHOTO OPTICAL CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Usually, to measure the eccentricity of one inspected surface, more than 10 images of standard images at different positions are required, so it is difficult to perform the above-mentioned masking work on each image, and the time required for measurement also increases significantly.
Therefore, depending on the judgment of the operator, the image provided during the measurement of the eccentricity amount is sparse (indented), and the measurement accuracy may also be reduced.

Method used

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  • Off-centering quantity measuring apparatus
  • Off-centering quantity measuring apparatus
  • Off-centering quantity measuring apparatus

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Embodiment Construction

[0031] Hereinafter, embodiments according to the present invention will be described in detail with reference to the drawings. figure 1 It is a schematic configuration diagram of an eccentricity measurement device according to an embodiment of the present invention.

[0032] figure 1 The shown eccentricity measurement device 1 applies the autocollimation method to measure the eccentricity of each inspected surface of a lens body 5 as an optical element to be inspected, and includes a measuring head 10, and a base 20 that rotatably holds the lens body 5 , an analytical calculation unit 30 for performing various calculations for calculating the amount of eccentricity, and a Z-axis stage 40 for holding the measuring head 10 so as to be movable in the vertical direction in the figure.

[0033] The above-mentioned measuring head 10 is equipped with: a light source 11, which outputs the light beam irradiated on the above-mentioned lens body 5; Referred to as "index line"); beam ...

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Abstract

The invention provides an offset measurement device, wherein the device includes: a base (20) which can rotatably hold a lens body (5); a measurement head (10) which irradiates the light from a light source (11) onto a lens surface (52a) and images reticule images on a focus surface thereof, as well as guides a reflective light from the lens surface (52a) onto a camera surface and images the reticule images at the camera surface, the imaging is corresponding to each image at each rotational position; an analysis operating section (30), which analyzes the offset according to the imaged each image. The analysis operating section (30) is configured to eradicate the useless images of the reticule images from the images by obtaining differential images of each image. When the offset is measured via a suitable self-collimation method, positions of standard images on the image still can be specialized even if the useless images imaged through other surfaces, except the standard images imagedthrough the measured surface, are carried on the images.

Description

[0001] technology area [0002] The present invention relates to an eccentricity measurement device for measuring the eccentricity of a surface to be inspected in an optical element such as a lens, and more particularly to an eccentricity measuring device suitable for measuring the eccentricity of each surface to be inspected in an optical element composed of a plurality of lenses or the like. Quantitative measuring device. Background technique [0003] Conventionally, as such an eccentricity measuring device, a measuring unit to which a so-called autocollimation method is applied is known (see Patent Documents 1 and 2 below). [0004] In the self-collimation method, the focal plane and the imaging surface of the inspected surface of the optical element to be inspected are in a conjugate position relationship through the inspected surface to adjust the position of the inspected surface and the optical system, so that the inspected surface surrounds Rotate around a specified r...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01M11/02G01B11/27
Inventor 孙萍
Owner FUJI PHOTO OPTICAL CO LTD