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Lithographic apparatus

A kind of lithography equipment and equipment technology, applied in the direction of microlithography exposure equipment, optomechanical equipment, optics, etc., can solve unexpected problems

Inactive Publication Date: 2011-06-29
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This requires additional or more powerful electric motors, and turbulence in the liquid may cause undesired or unpredictable effects

Method used

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  • Lithographic apparatus
  • Lithographic apparatus
  • Lithographic apparatus

Examples

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Embodiment Construction

[0034] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The equipment includes:

[0035] an illumination system (illuminator) IL configured to condition a radiation beam B (eg, ultraviolet (UV) radiation or deep ultraviolet (DUV) radiation);

[0036] a support structure (e.g. a mask table) MT configured to support a patterning device (e.g. a mask) MA and connected to a first positioning device PM configured to precisely position the patterning device according to determined parameters;

[0037] a substrate table (e.g. a wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and connected to a second positioner PW configured to precisely position the substrate according to determined parameters ;as well as

[0038] A projection system (e.g. a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a target portion...

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Abstract

A barrier member (10) is disclosed for use in immersion lithography. The barrier member comprises an extractor assembly (70) on a bottom surface which faces the substrate (W). The extractor assembly (70) includes a plate (200) which splits the space between a liquid removal device and the substrate in two such that a meniscus (310) is formed in an upper channel (220) between the liquid removal device and the plate and a meniscus is formed in a lower channel (230) between the plate and the substrate.

Description

[0001] related application [0002] This application is a continuation-in-part of US Common Patent Application No. 11 / 274888 filed on November 16, 2005, the entire contents of which are hereby incorporated herein by reference. technical field [0003] The present application relates to a lithographic apparatus. Background technique [0004] A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred via imaging to a layer of radiation sensitive material (resis...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70341
Inventor J·J·奥腾斯N·腾凯特N·R·肯佩M·H·A·李德斯J·P·M·斯穆勒斯M·巴克斯S·舒勒普沃夫M·里庞
Owner ASML NETHERLANDS BV