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Calibration method for micro-image

A technology of microscopic images and calibration methods, applied in electronic circuit testing, measuring devices, instruments, etc., can solve problems such as optical microscope image drift, and achieve the effect of solving microscopic image drift.

Inactive Publication Date: 2009-06-24
SEMICON MFG INT (SHANGHAI) CORP +1
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Problems solved by technology

[0004] The purpose of the present invention is to provide a calibration method for microscopic images to solve the problem of image drift when the optical microscope is switched between different magnifications

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  • Calibration method for micro-image

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Embodiment Construction

[0011] The microscopic image is the image of the test piece on the slide stage under the objective lens with a central mark of the optical microscope. The center of a conventional objective is marked with a cross. The calibration method includes step 1: providing a calibration sample with a scale mark and the same mark as the center mark of the objective lens at the center. see figure 1 Calibration sample image. Since the center of the optical microscope is currently marked as a cross, in order to facilitate subsequent alignment, the center of the calibration sample is also a cross 1, which corresponds to the cross in the center of the objective lens. Step 2: Put the calibration sample on the slide stage, and align the cross marked on the center of the objective lens of the optical microscope under a certain magnification with the center mark cross 1 on the calibration sample. At this time, the magnification of the optical microscope is usually selected as a lower magnifica...

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Abstract

The invention provides a method for calibrating microscopic images, which is used for solving the problem of image drift at different multiplying factors of an optical microscope. The calibration comprises the following steps: 1, providing a calibration swatch with graduation marks and a center mark; 2, aligning the center mark of the calibration swatch with the center mark of an object lens at a certain multiplying factor; 3, switching the optical microscope to another multiplying factor and calculating the offset of the center mark of the object lens relative to the center mark of the calibration swatch; 4, locating the test point of a test piece at the multiplying factor in step 2; and 5, switching the multiplying factor to the multiplying factor in step 3, and moving the microscope stage placing the test piece according to the offset calculated in step 3. By adopting the method of the invention, the test point of the test piece can be rapidly located even under the condition that the microscopic image drifts, therefore, the problems of the low availability of a testing machine equipped with an optical microscope and the test process delay of the testing machine caused by the drift of the microscopic image are avoided.

Description

technical field [0001] The invention relates to the field of optical microscope testing, in particular to a method for preventing microscopic image drift during testing. Background technique [0002] With the increasing integration of semiconductor integrated chips, the testing of semiconductor devices increasingly requires an optical microscope (Optical Microscope) to assist testing. Optical microscopy is usually required to locate test points, or to locate defects on chips. However, during testing, in order to ensure accurate testing with high testing efficiency, it is necessary to locate testing areas and testing points under different microscopic magnifications. [0003] Since the test is performed on chips with feature sizes at or below the micron level, the precision of the optical microscope is required to be very high. When the accuracy of the optical components of the optical microscope does not meet the requirements, image drift will occur when switching between ...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B9/04G01R31/28G01R31/308
Inventor 朱珠梁山安张鸿罗旖旎
Owner SEMICON MFG INT (SHANGHAI) CORP
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