Unlock instant, AI-driven research and patent intelligence for your innovation.

Projection optical apparatus, exposure method and device manufacturing method

A technology of projection optical device and projection optical system, applied in microlithography exposure equipment, photolithography process exposure device, etc., can solve problems such as increasing cost, and achieve the effect of reducing continuity error and size reduction

Active Publication Date: 2012-07-18
NIKON CORP
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This further increases the cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Projection optical apparatus, exposure method and device manufacturing method
  • Projection optical apparatus, exposure method and device manufacturing method
  • Projection optical apparatus, exposure method and device manufacturing method

Examples

Experimental program
Comparison scheme
Effect test

no. 1 approach

[0048] Refer below Figures 1 to 12 A first embodiment of the present invention is described.

[0049] figure 1 A schematic configuration of a scanning projection exposure apparatus using a step-and-scan method according to a first embodiment of the present invention is shown. exist figure 1 Among them, the projection exposure apparatus includes an illumination unit IU, a mask stage MSTG, a projection optical system PL, a substrate stage PSTG, a drive mechanism (not shown), and a control unit (not shown). The illumination unit IU illuminates the pattern of the mask MA (first object) with illumination light emitted from a light source. The mask stage MSTG holds and moves the mask MA. The projection optical system PL projects an enlarged image of the pattern of the mask MA on the substrate (plate) PT (second object). The substrate stage PSTG holds and moves the substrate PT. The drive mechanism includes, for example, a linear motor for driving the mask stage MSTG and the s...

no. 2 approach

[0092] A second embodiment of the present invention will be described below with reference to FIGS. 13 to 17 . The gantry system of the scanning projection exposure apparatus according to this embodiment is the same as that described in the first embodiment. However, the projection optical device PLS of this embodiment and figure 1 The projection optical device PL of the first embodiment shown in is different in that: the projection optical device PLS uses only a single row of projection optical systems PL1 to PL3 instead of the first row and the second row of projection optical systems PL1 to PL5; The beam transmission member (beam deflecting (bending) member) displaces the beam in the non-scanning direction orthogonal to the scanning direction of the mask MA. The projection optical device PL of the second embodiment using the single-row projection optical system PL1 to PL3 performs two scanning exposures to transfer the entire pattern of the mask MA onto the substrate PT. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
Login to View More

Abstract

When forming a magnified image of a mask pattern on an object with a plurality of projection optical systems, the mask pattern is minimized in size. A projection exposure apparatus relatively moves a mask (MA) and a substrate (PT) and forms a magnified image of a pattern of the mask (MA). The apparatus includes projection optical systems (PL1, PL2), each having an enlargement magnification and forming an image of a pattern of the mask (MA) on the substrate (PT). A first line segment formed by connecting view points (a, b) of the projection optical systems (PL1, PL2) on the mask (MA) and a second line segment formed by connecting conjugate points (A, B) of the view points on the substrate (PT) form corresponding sides of two similar figures of which magnification ratio is the magnification.

Description

technical field [0001] The present invention relates to projection optics for forming an enlarged image of a first object, such as a mask, on a second object, such as a photosensitive substrate, and to exposure techniques and equipment manufacturing techniques using such projection optics. Background technique [0002] When manufacturing devices such as semiconductor element devices and liquid crystal display devices, a projection exposure apparatus that projects a pattern of a mask such as a reticle or a photomask onto a layer coated with a resist using a projection optical system is used. etchant substrates such as glass plates or semiconductor wafers. A projection exposure apparatus (stepper) using a step-and-scan system has been widely used conventionally. The step-and-scan projection exposure device exposes the mask pattern to a plurality of irradiation areas defined on the plate. In recent years, a step-and-scan projection exposure apparatus has been proposed that us...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 熊泽雅人登道男
Owner NIKON CORP