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Composition for photoresist stripper and method of fabricating thin film transistor array substrate

一种剥离剂、光刻胶的技术，应用在半导体/固态器件制造、图纹面的照相制版工艺、光学等方向，能够解决滤色片不平坦表面、显示质量恶化、破裂等问题

Active Publication Date: 2010-06-23
DONGJIN SEMICHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, it can cause swelling of the part of the color filter that is in contact with the photoresist stripper
In this case, the color filter may have an uneven surface, thereby deteriorating the adhesion between the color filter and another film overlying the color filter, which may cause loosening or cracking of the overlying film
In addition, there may be a thickness of a portion filled with liquid crystals that varies depending on the position, resulting in deterioration of display quality

Method used

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  • Composition for photoresist stripper and method of fabricating thin film transistor array substrate
  • Composition for photoresist stripper and method of fabricating thin film transistor array substrate
  • Composition for photoresist stripper and method of fabricating thin film transistor array substrate

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Embodiment 1-8 and comparative example 1-5

[0046] A composition for a photoresist stripper according to one or more embodiments of the present invention is prepared by stirring the components at 200-600 rpm at room temperature for 0.3-3 hours in a mixing tank equipped with a stirrer , the ratio of each component is listed in Table 1.

[0047] Table 1

[0048]

[0049] APM: N-(3-Aminopropyl)morpholine

[0050] HEP: 1-(2-Hydroxyethyl)piperazine

[0051] AEE: 2-(2-Aminoethoxy)ethanol

[0052] MIPA: Monoisopropanolamine

[0053] MEA: Monoethanolamine

[0054] BDG: Diethylene glycol monobutyl ether

[0055] BT: Benzotriazole

[0056] PY: Pyrogallic acid

[0057] TT: Tolyltriazole

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Abstract

A composition for a photoresist stripper and a method of fabricating a thin film transistor array substrate are provided according to one or more embodiments. In one or more embodiments, the composition includes about 5-30 weight % of a chain amine compound, about 0.5-10 weight % of a cyclic amine compound, about 10-80 weight % of a glycol ether compound, about 5-30 weight % of distilled water, and about 0.1-5 weight % of a corrosion inhibitor.

Description

[0001] Cross References to Related Applications [0002] This application claims priority from Korean Patent Application No. 10-2008-0128684 filed in the Korean Intellectual Property Office on December 17, 2008, the disclosure of which is incorporated herein by reference in its entirety. technical field [0003] Embodiments of the present invention generally relate to compositions for photoresist strippers and methods of manufacturing thin film transistor (TFT) array substrates. Background technique [0004] Currently, liquid crystal displays (LCDs) are some of the most widely used flat panel displays. An LCD has two substrates on which field generating electrodes are formed, and a liquid crystal layer interposed between the substrates. In an LCD, a voltage is applied to the electrodes to rearrange the liquid crystal molecules of the LCD, thereby controlling the amount of transmitted light. [0005] The LCD currently dominating the LCD market is an LCD in which two substra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42H01L21/82
CPCG03F7/425H01L27/1214H01L27/124H01L27/1288G03F7/42
Inventor 郑钟铉金俸均朴弘植洪瑄英崔永柱李炳珍徐南锡金炳郁尹锡壹郑宗铉辛成健许舜范郑世桓张斗瑛朴善周权五焕
Owner DONGJIN SEMICHEM CO LTD