Lithographic apparatus and device manufacturing method
A technology of lithography equipment and structure, applied in the direction of microlithography exposure equipment, optomechanical equipment, mechanical equipment, etc., can solve the problems of substrate table accurate positioning influence, complex control strategy, substrate table deformation or displacement, etc.
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[0023] figure 1A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithographic apparatus comprises: an illumination system (illuminator) IL configured to condition a radiation beam B (e.g., ultraviolet (UV) radiation or any other suitable radiation); a patterning device support structure or support structure (e.g., mask A mold table) MT configured to support a patterning device (eg mask) MA and connected to a first positioning device PM configured to precisely position the patterning device according to determined parameters. The apparatus also includes a substrate table (e.g., wafer table) WT or "substrate support structure" configured to hold a substrate (e.g., a resist-coated wafer) W and configured to be precisely positioned according to certain parameters. The second positioner PW of the substrate is connected. The apparatus also includes a projection system (e.g. a refractive projection lens system) PS configured to project...
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