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Vacuum vapor deposition apparatus

A vapor deposition and phase deposition technology, which can be used in vacuum evaporation plating, ion implantation plating, metal material coating processes, etc., and can solve problems such as complex work and waste.

Inactive Publication Date: 2011-01-26
MITSUBISHI HEAVY IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it is a fact that a large amount of wasted steam such as steam adhering to the wall surface of the vacuum chamber etc. does not contribute to the thin film formation of the substrate
For this reason, tests need to be done in advance to obtain the data necessary to assess the amount of remaining vapor-deposited material, which involves quite complex work

Method used

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Examples

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no. 1 example

[0025] A first embodiment of the vacuum vapor deposition apparatus according to the present invention will be described below.

[0026] Such as figure 1 As described, the vacuum vapor deposition apparatus according to the first embodiment has the crucible 3 placed inside the vacuum chamber 1 . The crucible 3 is a container for evaporating the vapor deposition material 2 , which means that the vapor deposition material 2 is evaporated in the crucible 3 . As an example, in the first embodiment, aluminum is used as the vapor deposition material 2 .

[0027] The substrate 4 is placed inside the vacuum chamber 1 . The substrate 4 is passed over the crucible 3 to form a thin film thereon from the evaporated vapor deposition material 2 . it's here, figure 1 An example of how the substrate 4 moves during thin film formation is illustrated. A solid line indicates the position of the substrate 4 when the volume of the vapor deposition material 2 is measured, and a broken line indic...

no. 2 example

[0033] A second embodiment of the vacuum vapor deposition apparatus according to the present invention will be described below.

[0034] Such as figure 2 As shown, the vacuum vapor deposition apparatus according to the second embodiment has a crucible 3 placed inside a vacuum chamber 1 . The crucible 3 is a container for evaporating the vapor deposition material 2 , which means that the vapor deposition material 2 is evaporated in the crucible 3 . As an example, in the second embodiment, aluminum is used as the vapor deposition material 2 .

[0035] The substrate 4 is placed inside the vacuum chamber 1 . The substrate 4 is passed over the crucible 3 to form a thin film thereon from the evaporated vapor deposition material 2 . it's here, figure 2 An example of how the substrate 4 moves during thin film formation is illustrated. A solid line indicates the position of the substrate 4 when the volume of the vapor deposition material 2 is measured, and a broken line indicate...

no. 3 example

[0042]A third embodiment of the vacuum vapor deposition apparatus according to the present invention will be described below.

[0043] Such as image 3 As shown, the vacuum vapor deposition apparatus according to the third embodiment has a crucible 3 placed inside a vacuum chamber 1 . The crucible 3 is a container for evaporating the vapor deposition material 2 , which means that the vapor deposition material 2 is evaporated in the crucible 3 . As an example, in the third embodiment, aluminum is used as the vapor deposition material 2 .

[0044] The substrate 4 is placed inside the vacuum chamber 1 . The substrate 4 is passed over the crucible 3 to form a thin film thereon from the evaporated vapor deposition material 2 . it's here, image 3 An example of how the substrate 4 moves during thin film formation is illustrated. A solid line indicates the position of the substrate 4 when the volume of the vapor deposition material 2 is measured, and a broken line indicates the ...

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Abstract

Provided is a vacuum vapor deposition apparatus in which a crucible as a container for vaporizing a vapor deposition material is placed inside a vacuum chamber and a film is formed on a substrate by use of the vapor deposition material vaporized in the crucible. The apparatus includes measuring means for measuring a bulk of the vapor deposition material in the crucible from an outside of the vacuum chamber.

Description

technical field [0001] The present invention relates to a vacuum vapor deposition device. Background technique [0002] Hitherto, a vacuum vapor deposition apparatus is known in which a crucible as a container for evaporating a vapor deposition material is placed inside a vacuum chamber, and a thin film is formed on a substrate by using the vapor deposition material evaporated in the crucible. For such vacuum vapor deposition devices, knowledge of the amount of vapor deposition material remaining in the crucible is necessary to calculate when to refill the crucible with additional vapor deposition material. Knowing the amount of vapor deposition material left in the crucible also helps prevent crucible cracking due to differences in shrinkage between the crucible and vapor deposition material as they cool. [0003] In this regard, in common practice, the amount of remaining vapor-deposited material has been routinely estimated based on the rate and time period of film forma...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/54
CPCC23C14/52C23C14/543
Inventor 平野龙也柳雄二重冈伸之
Owner MITSUBISHI HEAVY IND LTD