Variable rectangular window adjusting mechanism

A technology of adjusting mechanism and rectangular window, which is applied in the direction of photolithography exposure device, microlithography exposure equipment, etc., can solve the problem of stray light passing through, and achieve the effect of improving the quality of lithography, accurate positioning, and simple and convenient realization

Inactive Publication Date: 2012-11-21
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

[0002] At present, in the step-scan projection lithography machine, there are usually iris diaphragms to adjust the size of the illumination area or the luminous flux. Light passes through, not applicable in some demanding occasions

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  • Variable rectangular window adjusting mechanism
  • Variable rectangular window adjusting mechanism
  • Variable rectangular window adjusting mechanism

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Embodiment Construction

[0013] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0014] A variable rectangular window adjustment mechanism of the present invention proposes a closed ring interconnection structure, that is, four baffles are connected to each other in pairs, and any two baffles can move relative to each other, but cannot be separated. The displacement of each baffle is determined by the corresponding position detector, driver, shaft and connecting block, and linear motion is made between the shaft and the baffle. This variable rectangular window adjustment mechanism can adjust any size of the window, including the closed state, and the four baffles are kept in the same plane.

[0015] Such as figure 1 Shown is the variable rectangular window adjustment mechanism of the present inventio...

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Abstract

The invention discloses a variable rectangular window adjusting mechanism. A servo control system consists of four groups of position detectors and drivers, and is used for driving four baffle plates respectively; and an adjustable-size rectangular window is formed by the four baffle plates at different positions. An enclosed annular interconnected structure is provided, namely the four baffle plates are connected pairwise, and any two baffle plates can move relatively without being separated from each other. The displacement of each baffle plate is determined by a corresponding position detector, a corresponding driver, a corresponding shaft and a corresponding connecting block, and the shaft slides relative to the baffle plate, so that relative linear movement is realized. In the variable rectangular window adjusting mechanism, a rectangular window of any size can be dynamically realized, an enclosing state is realized, and the four baffle plates are kept in the same plane.

Description

technical field [0001] The invention relates to a variable rectangular aperture in an illumination optical system or an imaging optical system, and also to a variable slit structure in a scanning photoetching device. Background technique [0002] At present, in the step-scan projection lithography machine, there are usually iris diaphragms to adjust the size of the illumination area or the luminous flux. Light passes through, and it is not applicable in some demanding occasions. Contents of the invention [0003] In order to solve the technical problems described in the background art, the object of the present invention is to propose a variable rectangular window adjustment mechanism. [0004] In order to achieve the purpose of the present invention, the technical solution adopted by the variable rectangular window adjustment mechanism of the present invention to solve the technical problem is: the mechanism includes a first position detector, a second position detector,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
Inventor 严伟胡松李艳丽杨勇王建陈铭勇
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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