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Light intensity uniformity automatic adjustment device and adjustment method

An automatic adjustment and automatic adjustment technology, which is applied in the direction of exposure devices, optics, and optomechanical equipment in the photoplate making process, can solve problems such as uneven light intensity, achieve uniform light intensity, improve uniformity, and reduce losses.

Active Publication Date: 2021-05-07
SEMICON MFG INT (SHANGHAI) CORP +1
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Problems solved by technology

[0004] The purpose of the present invention is to provide an automatic adjustment device and adjustment method for uniformity of light intensity, which can improve the unevenness of light intensity caused by lens loss

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  • Light intensity uniformity automatic adjustment device and adjustment method
  • Light intensity uniformity automatic adjustment device and adjustment method
  • Light intensity uniformity automatic adjustment device and adjustment method

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Embodiment Construction

[0038] The light intensity uniformity automatic adjustment device and adjustment method of the present invention will be described in more detail below with reference to the schematic diagrams, wherein the preferred embodiments of the present invention are shown. It should be understood that those skilled in the art can modify the present invention described herein, and still The advantageous effects of the present invention are achieved. Therefore, the following description should be construed as widely known to those skilled in the art and not as a limitation of the present invention.

[0039] The invention is described in more detail by way of example in the following paragraphs with reference to the accompanying drawings. The advantages and features of the present invention will become apparent from the following description and claims. It should be noted that, the accompanying drawings are all in a very simplified form and in inaccurate scales, and are only used to facil...

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Abstract

The invention discloses an automatic adjustment device and adjustment method for light intensity uniformity, including a light intensity real-time detection system, a light intensity analysis system and a light intensity automatic adjustment system; the light intensity real-time monitoring system detects the light intensity on the wafer workbench , and transmit the detection result to the light intensity analysis system; the light intensity analysis system combines a standard data to generate an adjustment signal and transmit it to the automatic light intensity adjustment system; the automatic light intensity adjustment system is based on the adjustment The signal adjusts the intensity of light emitted by the light source. In this way, the loss of the lens can be compensated and reduced in advance, and finally the goal of uniform light intensity can be achieved, so that the uniformity of the CD can be improved, and the quality of photolithography can be improved; moreover, the frequency of replacing components of the equipment can be reduced, and the cost can be effectively saved.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to an automatic adjustment device and adjustment method of light intensity uniformity. Background technique [0002] The lithography process is an important part of semiconductor production, which directly restricts the quality of products. The influencing factors of the lithography process mainly include two aspects, technical aspects and equipment aspects. The lithography equipment is the foundation for performing the lithography process. Therefore, it is particularly important to ensure the accuracy of the lithography equipment. [0003] However, equipment wear and tear is inevitable. Usually, when equipment wears out, it is necessary to replace spare components to improve the equipment condition. However, the cost of lithography equipment is extremely high, and it is necessary to replace it as soon as it is damaged, which is not conducive to reducing production costs. ...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70558
Inventor 杨鹏陈昌利何雄张轲姚宏忠
Owner SEMICON MFG INT (SHANGHAI) CORP
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