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Fluid handling structure, lithographic apparatus and a device manufacturing method

A technology of fluid handling and fluid, which is applied in the field of device manufacturing and can solve problems such as undesired

Active Publication Date: 2014-07-30
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This requires additional or more powerful electric motors, and turbulence in the liquid may cause undesired or unintended effects

Method used

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  • Fluid handling structure, lithographic apparatus and a device manufacturing method
  • Fluid handling structure, lithographic apparatus and a device manufacturing method
  • Fluid handling structure, lithographic apparatus and a device manufacturing method

Examples

Experimental program
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Effect test

Embodiment Construction

[0030] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithography equipment includes:

[0031] - an illumination system (illuminator) IL configured to condition a radiation beam B (eg, ultraviolet (UV) radiation or deep ultraviolet (DUV) radiation);

[0032] - a support structure (eg mask table) MT configured to support the patterning device (eg mask) MA and connected to first positioning means PM for precisely positioning the patterning device MA according to determined parameters;

[0033] - a substrate table (e.g. a wafer table) WT configured to hold a substrate (e.g. a resist-coated wafer) W and configured for a second positioner configured to precisely position the substrate W according to determined parameters device PW connected; and

[0034] - A projection system (eg a refractive projection lens system) PS configured to project the pattern imparted to the radiation beam B by the patterning device MA onto a t...

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PUM

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Abstract

The invention discloses a fluid processing structure, a photolithographic equipment and a device manufacturing method. The fluid handling structure is configured to supply immersion liquid to a space defined between the projection system and an opposing surface facing the fluid handling structure. The lower surface of the fluid handling structure has: a supply opening configured to supply fluid towards the facing surface; a plurality of extraction openings configured to remove fluid between the fluid handling structure and the facing surface; protrusion.

Description

technical field [0001] The present invention relates to a fluid handling structure, a photolithographic apparatus and a device manufacturing method. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Typically, a single substrate will contain a network of adjacent target portions that are successively patterned. Known lithogr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70341Y10T137/86292G03F7/2041G03F7/2043H01L21/0274
Inventor D·M·H·菲利浦斯D·J·M·迪莱克斯C·J·G·范德顿根M·A·C·斯凯皮斯P·P·J·伯克文斯M·J·范德赞登P·马尔德
Owner ASML NETHERLANDS BV