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Light sensitization composition using p-toluenesulfonylhydrazide hydrazone compound and application of light sensitization composition

A technology using sulfonyl hydrazone and composition, which is applied in the application field of positive thermal CTP plates, can solve the problems of poor thermal stability and short storage life, and achieve good thermal stability, long service life, and development fast effect

Active Publication Date: 2013-05-01
LUCKY HUAGUANG GRAPHICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The technical problem to be solved in the present invention is: because sulfonylhydrazide compound has strong reducibility and poor thermal stability, it is easy to decompose in acid and alkali, and the storage life of the photosensitive composition using sulfonylhydrazide compound in solvent is short, Provide a photosensitive composition using sulfonylhydrazone compounds and its application in positive thermal CTP plates

Method used

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  • Light sensitization composition using p-toluenesulfonylhydrazide hydrazone compound and application of light sensitization composition
  • Light sensitization composition using p-toluenesulfonylhydrazide hydrazone compound and application of light sensitization composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Preparation of Positive Thermal CTP Plate

[0027] (1) Preparation of aluminum plate base:

[0028] An aluminum plate with a thickness of 0.28mm is subjected to degreasing treatment for 40 seconds in a 7wt% sodium hydroxide aqueous solution at a temperature of 55°C. Use sine wave alternating current for electrolytic treatment, 50HZ alternating current, current 50A / dm 2 , the electrolysis time is 60 seconds, control Ra=0.3-0.6um, preferably 0.4-0.6um, .Rz (H) The value is 2~3μm. Then, at a temperature of 60°C, deslagging treatment was performed for 10 seconds in a 50wt% aqueous solution of sodium hydroxide, and then at a temperature of 25°C, the current density was 5A / d m 2 , the concentration is 20wt% sulfuric acid solution for 40 seconds, control oxide film = 2.5-3.5g / m 2 . Finally, at 60 °C with NaH 2 PO 4 -NaF solution is sealed for 30 seconds to obtain an aluminum base suitable for a lithographic printing plate.

[0029] (2) Apply the prepared photosensitive...

Embodiment 2

[0050] The photosensitive liquid is shown in Table 4:

[0051] Table four

[0052] BTB29 resin (Weihai Tiancheng Chemical Co., Ltd.)

[0053] The above-mentioned photosensitive lithographic plate is installed on the plate-making machine for exposure. Use alkaline developer TPD-II (manufactured by Lucky Group No. 2 Film) to develop at 25°C for 30 seconds. The results of sensitivity, development latitude and photosensitive solution stability are shown in Table 9.

Embodiment 3

[0055] The photosensitive liquid is shown in Table 5:

[0056] Table five

[0057] BTB29 resin (Weihai Tiancheng Chemical Co., Ltd.)

[0058] The above-mentioned photosensitive lithographic plate is installed on the plate-making machine for exposure. Use alkaline developer TPD-II (manufactured by Lucky Group No. 2 Film) to develop at 25°C for 30 seconds. The results of sensitivity, development latitude and photosensitive solution stability are shown in Table 9.

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Abstract

The invention discloses a light sensitization composition using a sulfonyl hydrazone compound. The composition comprises a dissolving resistant / dissolving promotion agent, an alkali soluble line type phenolic resin, an infrared absorption dye, a background dye and a solvent, wherein the dissolving resistant / dissolving promotion agent is a cyclohexanone sulfonyl hydrazone compound. The sulfonyl hydrazone compound provided by the invention is added into the light sensitization composition and can be quickly subjected to chemolysis to generate N2 for foaming only when the temperature of a scanning area is higher than 170 DEG C. In the decomposition foaming process, the membranous layer of the scanning area is loosened and is easy to develop, and most of small segments remained on the membranous layer after the decomposition are acidic materials of different types, so that an obvious dissolving promotion effect is generated during alkali development, and the composition has high thermal stability and long service life. Therefore, the cyclohexanone sulfonyl hydrazone compound is used as the dissolving resistant / dissolving promotion agent of the light sensitization composition, so that a thermosensitive computer to plate (CTP) board with high sensitivity and high development speed can be obtained.

Description

technical field [0001] The invention relates to a photosensitive composition, in particular to a photosensitive composition using a sulfonyl hydrazone compound and its application in positive thermosensitive CTP plates. Background technique [0002] Japanese Mitsubishi Chemical Co., Ltd.’s patent publication No. 9-319074 discloses a water-free offset printing plate made of sulfonylhydrazine compounds such as p-toluenesulfonylhydrazide, which uses heat to cause chemical changes in sulfonylhydrazide compounds to produce N 2 A good attempt at imaging by raising the scanning portion. However, simple sulfonylhydrazine compounds are rarely of use in general heat-sensitive CTP plates, which is because: (1) the molecule of sulfonylhydrazide compounds contains a -NH 2 , the-NH 2 The hydrogen-donating and reducing ability is extremely strong, and it can form corresponding acids (mostly strong acids or super acids) with the compatible ions of the photothermal conversion material infr...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/09
Inventor 滕方迁余尚先门红伟李合成冯磊焦红军
Owner LUCKY HUAGUANG GRAPHICS
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