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Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus

A technology of lithography equipment and solutions, applied in microlithography exposure equipment, optomechanical equipment, optics, etc., can solve problems such as immersion liquid evaporation

Active Publication Date: 2015-01-07
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

While such systems improve substrate temperature control and handling, evaporation of the immersion liquid can still occur

Method used

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  • Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus
  • Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus
  • Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically shown. The lithographic apparatus includes: an irradiation system (illuminator) IL, which is configured to adjust a radiation beam B (for example, ultraviolet (UV) radiation or deep ultraviolet (DUV) radiation); a support structure (for example, a mask table) MT, It is configured to support the patterning device (such as a mask) MA, and is connected to a first positioning device PM configured to accurately position the patterning device MA according to determined parameters; a substrate table (such as a wafer table) WT, its configuration Used to hold a substrate (for example, a resist coated wafer) W, and is connected to a second positioning device PW configured to accurately position the substrate W according to determined parameters; and a projection system (for example, a refractive projection lens System) PS (supported by a frame), which is configured to project th...

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PUM

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Abstract

A method of adjusting speed and / or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and / or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and / or (ii) a discrete movement for which the risk of a bubble is determined.

Description

Technical field [0001] The present invention relates to a method for adjusting the speed and / or route in a moving plan of a table and a lithographic equipment. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment can be used in the manufacture of integrated circuits (ICs). In this case, a patterning device optionally called a mask or a reticle can be used to generate a circuit pattern to be formed on a single layer of the IC. The pattern can be transferred to a target portion (e.g., including a portion of a die, one or more die) on a substrate (e.g., a silicon wafer). Generally, the transfer of the pattern is performed by imaging the pattern onto a layer of radiation sensitive material (resist) provided on the substrate. Generally, a single substrate will contain a network of adjacent target portions that are continuously patterned. Know...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70341G03F7/70725G03F7/00G03F7/20G03F7/70775
Inventor C·D·格乌斯塔N·R·肯帕N·J·M·范登涅乌维拉尔D·德伍利斯李华M·乔詹姆森
Owner ASML NETHERLANDS BV