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Baffle Plates For An Ultraviolet Reactor

一种反应器、隔板的技术，应用在紫外反应器领域，能够解决没有接受到等问题

Inactive Publication Date: 2012-05-30
СИМЕНС УОТЕР ТЕКНОЛОДЖИЗ ПТЕ. ЛТД.
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, most of the water in the UV chamber 14 does not receive enough UV energy

Method used

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  • Baffle Plates For An Ultraviolet Reactor
  • Baffle Plates For An Ultraviolet Reactor
  • Baffle Plates For An Ultraviolet Reactor

Examples

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Embodiment Construction

[0016] Before describing any embodiment of the present invention in detail, it should be understood that the application of the present invention is not limited to the details of the structure and arrangement of components described below or illustrated in the following figures. The invention is capable of other embodiments and of being practiced or carried out in various ways. Also, it is to be understood that the phraseology and terminology herein are used for the purpose of description and should not be regarded as limiting. Use of "including," "comprising," or "having" and variations thereof herein means including the items listed thereafter and their equivalents as well as additional items. Unless specified or otherwise qualified, the terms "mount", "connect", "support", and "coupling" and variations thereof are used broadly and include direct and indirect mounts, connections, supports and couplings pieces. Furthermore, "connected" and "coupled" are not limited to physi...

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Abstract

An ultraviolet reactor for treating a fluid. The reactor includes a vessel having an inlet for receiving fluid and an outlet for discharging fluid. The reactor further includes an ultraviolet light source and baffle plates. The baffle plates include holes arranged in a predetermined pattern for providing plug flow in areas in the reactor near the ultraviolet light source.

Description

[0001] Cross References to Related Applications [0002] This application claims the benefit of application No. 61 / 230,040, filed July 30, 2009, entitled "ULTRAVIOLET TANK BAFFLE DESIGN FOR ADVANCED OXIDATION PROCESS" under 35 U.S.C. § 119(e). ULTRAVIOLET TANK BUFFER DESIGN USING DIVERTER PLATE), and application number 61 / 230,045 filed July 30, 2009, entitled "ULTRAVIOLET TANK BUFFER DESIGN USING DIVERTER PLATE" ), each of which is hereby incorporated by reference in its entirety, and this application claims the benefit of priority from the above applications. technical field [0003] The present invention relates to ultraviolet reactors, and more particularly to partitions having a predetermined pattern of holes to provide plug flow. Background technique [0004] Ultraviolet (UV) reactors can be used to disinfect water by rendering bacteria harmless or stimulating oxidants to reduce total organic carbon (TOC). In certain applications, the UV reactor includes baffles that ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C02F1/32
CPCC02F2301/024C02F2201/3223C02F2301/02C02F2301/022C02F1/325C02F2201/328B01J19/006B01J19/123B01J19/2415B01J2219/00768A61L2/10B63B13/02B63B2013/005
Inventor Z·M·J·杨D·施蒂比茨B·L·库尔特M·S·胡瑟
Owner СИМЕНС УОТЕР ТЕКНОЛОДЖИЗ ПТЕ. ЛТД.
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