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Device for removing impurity ions

A technology of impurity ions and anions, which is applied in the field of impurity ion removal devices, can solve the problems of difficulty in obtaining detection sensitivity and stable data with good detection sensitivity, and achieve continuous and stable removal operation, excellent detection sensitivity and long operating life Effect

Active Publication Date: 2012-07-11
NICHIRI INDS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0014] In the above-mentioned typical suppressor in which an electric field is applied to the column type, there are the following problems: the former vertical column type has a limitation that it is difficult to obtain stable da

Method used

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  • Device for removing impurity ions
  • Device for removing impurity ions
  • Device for removing impurity ions

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0106] Figure 8 with Figure 9 The ion analysis system shown is used with Figure 9 Ion analysis system 100 of the same structure, electrolytic solution purification device 2 uses and Figure 6 The impurity ion removal device 2e for anion removal with the same structure is compared with the basic structure figure 1 The ion removal capability of the impurity ion removal device 9 having the same structure was examined.

[0107] In the experiment, from Figure 9 The syringe 5 and the separation column 7 are taken out of the ion analysis system 100 for use.

[0108] Electrolyte solution generator 1 uses an alkaline electrolyte solution generator (manufactured by Nichiri Kogyo), electrolyte solution purification unit 2e uses anion removal impurity ion remover (Nichiri Kogyo), and impurity ion remover 9 uses cation removal impurity ions The removal device (manufactured by Nichiri Kogyo), CCPM (manufactured by Tosoh Corporation) for pumps 47a and 47b, DP-8020 (manufactured by T...

Embodiment 2

[0112] Figure 8 with Figure 9 The ion analysis system shown in is used with Figure 9 The ion analysis system 100 of the same structure is used in the electrolytic solution purification device 2 and Figure 7 The anion removal of the same structure uses the impurity ion removal device 2f, and the impurity ion removal device 9 uses the same figure 2 Cationic impurity ion removal device 9a of the same structure, for the sodium hydroxide solution (about 12.5mM, about 1965μS / cm) generated in the electrolytic solution generator 1, compare the conductivity of the eluent when the suppressor is working and when it is not working . In the experiment, from Figure 9 The syringe 5 and the separation column 7 are taken out of the ion analysis system 100 for use. The electrolytic solution production unit 1 uses an alkaline electrolytic solution production unit (manufactured by Nichiri Kogyo), the electrolytic solution purification unit 2f uses an anion-removing impurity ion removal...

Embodiment 3

[0115] Figure 8 with Figure 9 The ion analysis system shown in is used with Figure 9 The ion analysis system 100 of the same structure is used in the electrolytic solution purification device 2 and Figure 7 The anion removal of the same structure uses the impurity ion removal device 2f, and the impurity ion removal device 9 uses the same figure 2 The cationic impurity ion removing device 9a having the same structure performs ion analysis of negative ions. The electrolytic solution production unit 1 uses an alkaline electrolytic solution production unit (manufactured by Nichiri Kogyo), the electrolytic solution purification unit 2f uses an anion-removing impurity ion removal unit (Nichiri Kogyo), and the impurity ion removal unit 9a uses a cation-removal impurity ion Removal device (manufactured by Nichiri Kogyo), CCPM (manufactured by Tosoh Co., Ltd.) for pumps 47a and 47b, DP-8020 (manufactured by Tosoh Co., Ltd.) for pump 3, model 7125 (manufactured by RHEODYNE Co., ...

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Abstract

A means for removing impurity ions from a solution, a column-shaped ion removal device in which an active substance or gas that generates in the vicinity of the electrodes does not come into the system and with which ions to be examined can be taken out with satisfactory detection sensitivity. A horizontal column packed with an ion exchanger that adsorbs impurity ions is provided with a solution inlet at the top of the column and near one of the electrodes and with an outlet at the bottom of the column and on the side of the other electrode to configure a narrow liquid channel. An ion-exchange membrane and an ion exchanger are used in combination to form an ion interface at each end of the column, and ions which generate as a result of a shift from water dissociation equilibrium are allowed to move toward the electrodes. Impurity ions to be removed are discharged from the column while regenerating the ion exchanger that adsorbs the impurity ions. In combination therewith, water is introduced externally and passed through the region between each electrode and the corresponding ion-exchange membrane to accelerate the discharge of the gases, the bases and acids, which are impurity ions to be removed, and active substances from the column.

Description

technical field [0001] The present invention relates to a device for removing impurity ions contained in a solution. Background technique [0002] The present invention relates to the removal device of impurity ion contained in the solution that is widely suitable for chemical analysis, synthesis, treatment, especially provides the suppressor (ion removal device) that is suitable for ion chromatograph (device), the purification of eluent device. In ion chromatography (separation operation method), a suppressor has been proposed long ago, and it is not necessary to explain it again. The suppressor is a device in which an eluent flows through a separation column to separate and wash ions adsorbed in the separation column. When the eluent is introduced into the detector, the suppressor removes the background electrolyte ions other than the detection target ions to obtain highly sensitive analytical values. There are roughly two forms of suppressors, column type and ion exchan...

Claims

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Application Information

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IPC IPC(8): G01N30/02G01N30/88G01N30/96
CPCC02F1/469B01J47/06B01J41/20B01J47/12C02F1/42B01D61/44B01J47/00B01J39/26B01J47/022B01J47/003B01D61/46C02F1/00B01J47/014B01D61/463
Inventor 增长洋登丸山昇
Owner NICHIRI INDS