Testing method for marginal adaptation of exposure table of exposure machine

A test method and technology of an exposure table, which is applied in microlithography exposure equipment, photolithography exposure equipment, liquid tightness measurement using liquid/vacuum degree, etc., can solve the problems of negligible, general, single monitoring, etc.

Inactive Publication Date: 2012-07-25
常熟金像电子有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

After using this method, it can overcome the shortcomings of the existing technology that the monitoring of table vacuum is too simple and general, and the effect of monitoring light leakage in single points or local areas is negligible, and realize the monitoring of the tightness of the exposure table of the exposure machine for timely point inspection and maintenance. To prevent light leakage in advance

Method used

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  • Testing method for marginal adaptation of exposure table of exposure machine
  • Testing method for marginal adaptation of exposure table of exposure machine
  • Testing method for marginal adaptation of exposure table of exposure machine

Examples

Experimental program
Comparison scheme
Effect test

specific Embodiment 1

[0016] Install a blank film whose length and width are 0-1 inch smaller than the exposure table on the exposure table, absorb 1 drop of colorless water on the four corners and the middle of the upper film, as attached figure 2 As shown, the position of the drop of liquid at the four corners is 4 cm away from the edge of the film, the frame is closed and sucked into a vacuum, and the diffusion of the water film is observed. The test results are shown in the attached Figure 5 As shown, it can be judged that the tightness of the exposure table is better.

specific Embodiment 2

[0017] Install a blank film whose length and width are 0-1 inches smaller than the exposure table on the exposure table, absorb 1 drop of red alcohol on the four corners and the middle of the lower film, as attached image 3 As shown, the position where the alcohol drops at the four corners is 5 cm away from the edge of the negative film, the frame is closed and sucked into a vacuum, and the diffusion of the alcohol film is observed. The test results are shown in the attached Image 6 As shown, it can be judged that the tightness of the exposure table is not good.

specific Embodiment 3

[0018] Install a blank film whose length and width are 0-1 inch smaller than the exposure table on the exposure table, absorb 5 drops of green water on the four corners and the middle of the upper film, as attached Figure 4 As shown, the dripping position at the four corners is 10 cm away from the edge of the film, the frame is closed and sucked into a vacuum, and the diffusion of the water film is observed. The test results are shown in the attached Figure 7 As shown, it can be judged that the tightness of the exposure table is better.

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PUM

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Abstract

The invention relates to a testing method for the marginal adaptation of an exposure table of an exposure machine. The testing method mainly comprises the following steps of: mounting a blank film on an exposure table top, wherein the length and the width of the film are smaller than those of the exposure table by 0-1 cun; sucking 1-5 drops of water or alcohol and dripping the water or the alcohol to the four corners and the middle of the film; closing the framework of the exposure table and vacuumizing the frame; and observing the film diffusion condition of the water or the alcohol, and judging whether the marginal adaptation of the framework is qualified or not according to the film diffusion condition of the water or the alcohol for monitoring the marginal adaptation of the exposure table top. By using the method, the defects of single and general monitoring to the vacuum of the table top and poor light leak monitoring effect on a single point or a local area in the prior art can be overcome, and the marginal adaptation of the exposure table of the exposure machine can be monitored for timely point inspection and maintenance so as to prevent light leak in advance.

Description

technical field [0001] The invention relates to the technical field of printed circuit boards, in particular to the field of PCB image transfer exposure production, and is mainly used for monitoring the closeness of exposure tables. [0002] Background technique [0003] At present, in the field of PCB image transfer production, the vacuum degree control of exposure operations is mainly divided into film vacuum and table vacuum. as attached figure 1 As shown, the film vacuum controls the vacuum between A and B or between C and D; the table vacuum controls the vacuum between A and C or between B and D. [0004] The film vacuum control is mainly based on the film vacuum gauge on the machine to monitor the film vacuum value, supplemented by the Newton ring clarity displayed between the film and the glass after the film is vacuumed. The table vacuum control mainly uses the table vacuum gauge on the machine to monitor the table vacuum value. [0005] The prior art is ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M3/02G03F7/20
Inventor 杨长基
Owner 常熟金像电子有限公司
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