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Reverse IGBT (insulated gate bipolar transistor) device structure and manufacturing method therefor

A device structure and manufacturing method technology, applied in the field of IGBT, can solve the problems of reducing the tape-out yield, debris and scratches, etc., to reduce the probability of debris and scratches, improve the yield, and avoid the effect of flipping the process

Active Publication Date: 2015-02-11
JIANGSU CAS JUNSHINE TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The back of conventional IGBTs are doped with P-type, while the reverse-conducting IGBT is partially doped with P-type and partially doped with N-type, so it is necessary to add a photolithography process on the back after the front process is completed, and this Due to the need for flipping, gluing, gluing, photolithography and other processes, it is easy to cause debris and scratches, thereby reducing the yield of tape-out

Method used

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  • Reverse IGBT (insulated gate bipolar transistor) device structure and manufacturing method therefor
  • Reverse IGBT (insulated gate bipolar transistor) device structure and manufacturing method therefor
  • Reverse IGBT (insulated gate bipolar transistor) device structure and manufacturing method therefor

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Embodiment Construction

[0035] The present invention will be further described below in conjunction with specific drawings.

[0036] Such as Figure 1 to Figure 10 Shown: Taking an N-type IGBT device as an example, the present invention includes an N-drift region 1, a gate oxide layer 2, a polycrystalline gate 3, an emitter 4, a gate electrode 5, a P-type base region 6, an N+ emitter region 7, a P+ Collector region 8 , P+ collector metal region 9 , P doped region 10 .

[0037] Such as figure 1 , Figure 10As shown, on the cross-section of the reverse conducting IGBT device, the semiconductor substrate includes an N-drift region 1, and the N-drift region 1 has a front and a back side parallel to each other; a P-type base region is provided in the N-drift region 1 6. The P-type base region 6 extends from the front to the back of the N-drift region 1, and the extension distance of the P-type base region 6 is less than the thickness of the N-drift region 1; the P-type base region 6 is provided with an...

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Abstract

The invention relates to a reverse IGBT (insulated gate bipolar transistor) device structure, which comprises a first conduction type drift region, wherein a second conduction type base region is arranged in the first conduction type drift region, and the upper part of the second conduction type base region is provided with a first conduction type emission region; the second conduction type base region is isolated by a gate oxidation layer and the first conduction type drift region positioned under the gate oxidation layer; the gate oxidation layer is in contact with the second conduction type base region at the two sides and is in contact with the adjacent first conduction type emission region in the second conduction type base region; a polycrystal gate is arranged on the gate oxidation layer, and a gate electrode is arranged on the polycrystal gate; an emission electrode is arranged on the second conduction type base region and is in contact with the second conduction type base region and the first conduction type emission region in the second conduction type base region; and the bottom of the first conduction type drift region is provided with a second conduction type collector region, and a second conduction type collector metal region is arranged on the back surface of the first conduction type drift region. According to the reverse IGBT device structure, a back photolithography technique is avoided, and the probability of fragment and scratching in the tape-out process can be lowered.

Description

technical field [0001] The invention relates to a semiconductor device and a manufacturing method thereof, in particular to a reverse conduction IGBT device structure and a manufacturing method, belonging to the technical field of IGBTs. Background technique [0002] IGBT is the acronym for Insulated Gate Bipolar Transistor. It is a voltage-controlled power device and is widely used as a high-voltage switch. [0003] When the traditional IGBT is subjected to reverse voltage, the collector junction is reverse-biased and cannot be turned on. The reverse conduction IGBT allows current to flow from the emitter to the collector when the IGBT is subjected to reverse voltage. The idea of ​​reverse conduction IGBT saves chip area, packaging, and testing costs, and reduces device costs. In addition, it also has low loss, good SOA (service-oriented architecture) characteristics, positive temperature coefficient, and good soft-off characteristics, short-circuit characteristics and go...

Claims

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Application Information

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IPC IPC(8): H01L29/739H01L29/06H01L21/331
Inventor 徐承福朱阳军卢烁今陈宏吴凯邱颖斌
Owner JIANGSU CAS JUNSHINE TECH
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