Method for measurement of silicon-based graphics chip surface benzotriazole concentration through infrared reflection technique

A technology of benzotriazole and infrared reflection, which is applied in measuring devices, color/spectral characteristic measurement, material analysis through optical means, etc. It can solve the problems of inability to detect BTA concentration on the surface of large-sized wafers, etc.

Inactive Publication Date: 2013-03-13
HEBEI UNIV OF TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] The technical problem to be solved by the present invention is to overcome the deficiency that existing methods cannot detect the BTA concentr

Method used

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  • Method for measurement of silicon-based graphics chip surface benzotriazole concentration through infrared reflection technique
  • Method for measurement of silicon-based graphics chip surface benzotriazole concentration through infrared reflection technique
  • Method for measurement of silicon-based graphics chip surface benzotriazole concentration through infrared reflection technique

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Experimental program
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Embodiment 1

[0019] Firstly, prepare the sample before testing: place the benzotriazole in a vacuum or a blast oven to dry to remove the free water contained in the sample. Using absolute ethanol as a solvent, benzotriazoles were prepared into 0.1 mol / L, 0.15 mol / L, 0.2 mol / L, 0.25 mol / L, 0.3 mol / L BTA, respectively. Use the microsampler to get the prepared BTA of the same volume and add it dropwise on the silicon-based graphic chip of twelve inches according to the position of the five-point method, such as figure 1 shown. Leave the silicon-based graphic sheet dripped with BTA for half an hour to make it diffuse evenly. Place the static silicon-based graphic sheet on the map300 sample stage, and use Nicolet 6700 Fourier transform infrared spectrometer to measure its infrared spectrum (see figure 2 ), use TQ Analyst (infrared quantitative analysis) to build a model curve, the steps are as follows: 1. Open TQ Analyst (infrared quantitative analysis) software, select Description (descript...

Embodiment 2

[0022] Firstly, prepare the sample before testing: place the benzotriazole in a vacuum or a blast oven to dry to remove the free water contained in the sample. Using absolute ethanol as a solvent, the benzotriazole was formulated into 0.15 mol / L, 0.2 mol / L, 0.25 mol / L, 0.3 mol / L, 0.35 mol / L BTA, respectively. Use the microsampler to get the prepared BTA of the same volume and add it dropwise on the silicon-based graphic chip of twelve inches according to the position of the five-point method, such as figure 1 shown. Leave the silicon-based graphic sheet dripped with BTA for half an hour to make it diffuse evenly. Place the silicon-based graphic sheet after standing on the map300 sample stage, use Nicolet 6700 Fourier transform infrared spectrometer to measure its infrared spectrum, use TQ Analyst (infrared quantitative analysis) to establish a model curve, the steps are as in Example 1; after polishing Place the sample on the MAP300 sample stage, open the OMNIC software, mea...

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Abstract

The invention discloses a method for measurement of silicon-based graphics chip surface benzotriazole (BTA) through an infrared reflection technique. The method provided in the invention is performed according to the steps of: preparing dried benzotriazole into BTA with concentrations of 0.1mol/L-0.15mol/L, 0.15mol/L-0.2mol/L, 0.2mol/L-0.25mol/L, 0.25mol/L-0.3mol/L, and 0.3mol/L-0.35mol/L respectively; adding the prepared BTA dropwisely to a 12-inch silicon-based graphics chip according to positions of a five-spot pattern, and measuring the concentration by the infrared reflection technique; employing TQAnalyst (infrared quantitative analysis) to establish a model curve, saving it as a quantitative analysis standard; and while detecting the benzotriazole (BTA) concentrations of other samples, first conducting detection to generate a spectrogram, and then employing the quantitative analysis standard mentioned in last step to carry out quantitative analysis. The method provided in the invention solves the problem of benzotriazole (BTA) concentration measurement on a 12-inch wafer sample table, and other methods all cannot meet the demand for nondestructive measurement of BTA on a 12-inch wafer.

Description

technical field [0001] The invention relates to the field of detecting the concentration of benzotriazole (BTA) on the surface of a silicon-based graphic sheet, and more specifically relates to a method for detecting the concentration of benzotriazole (BTA) on the surface of a silicon-based graphic sheet by using an infrared reflection method. Background technique [0002] With the rapid development of integrated circuits, the integration level of devices is continuously improved, and the feature size of devices is getting smaller and smaller, so the cleanliness of the substrate surface is also getting higher and higher. At present, chemical mechanical polishing (CMP) technology has been rapidly developed in ULSI manufacturing. CMP has been widely used in the interlayer global planarization of substrates and multilayer metal interconnection structures, and has become a key technology for manufacturing mainstream chips. [0003] Polishing fluid plays a very important role in ...

Claims

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Application Information

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IPC IPC(8): G01N21/35G01N21/3563
Inventor 潘国峰刘玉岭高宝红周建伟黄妍妍邵琳伟
Owner HEBEI UNIV OF TECH
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