Unlock instant, AI-driven research and patent intelligence for your innovation.

Method for preventing the collapse of high aspect ratio structures during drying

A high aspect ratio, dry technology, applied in the direction of microstructure technology, microstructure devices, manufacturing microstructure devices, etc., can solve problems such as distortion and collapse

Inactive Publication Date: 2013-05-01
ADVANCED TECH MATERIALS INC
View PDF1 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This distortion and collapse still occurs during drying using prior art compositions and methods

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preventing the collapse of high aspect ratio structures during drying
  • Method for preventing the collapse of high aspect ratio structures during drying
  • Method for preventing the collapse of high aspect ratio structures during drying

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0089] Blanketed TiN x General method flow for evaluating formulations on (ALD) substrates:

[0090] I. Surface treatment:

[0091] a. Rinse with acetone for 60 seconds

[0092] b. Rinse with IPA for 5 seconds

[0093] c. DI rinse, soak for 1 second; flow DI, 60 seconds

[0094] d. SC1 rinse (1 part NH 4 OH: 1 part H 2 o 2 : 5 copies of DI) 60 seconds

[0095] e. DI rinse, soak for 1 second; flow DI, 60 seconds

[0096] f. Dilute BOE wash (6 parts DI: 1 part BOE) for 60 seconds

[0097] g. DI rinse, soak for 1 second; flow DI, 60 seconds

[0098] II. Surface modification

[0099] a. Put 2×2cm TiN x Test strips (ALD) were fully immersed for 300 seconds at room temperature in a beaker or F20 pan containing the following formulation

[0100] b. DI rinse, soak for 1 second; flow DI, 60 seconds

[0101] III. Drying and measuring contact angle

[0102] a. Spin and dry on Laurel tool or on N 2 medium dry

[0103] b. Measurement of the contact angle of DI water on the ...

Embodiment 2

[0131] A general method flow for evaluating formulations on blanketed Ru(ALD) substrates is shown in image 3 .

[0132] Additional formulations were prepared.

[0133] Formulation AA: 0.5 wt% ODPA, 0.05 wt% defoamer A RD28, 99.45 wt% TPGME.

[0134] Formulation BB: 1.0 wt% dimethyldioctadecylammonium chloride, 0.1 wt% antifoam A RD28, 98.9 wt% DPGME.

[0135] Formulation CC: 1.0% by weight bis(hydrogenated tallow alkyl) dimethyl chloride, 0.1% by weight antifoam A RD28, 98.9% by weight TPGME.

[0136] The contact angle of each Ru wafer was measured at four different times: (a) upon receipt, (b) after pretreatment steps I, II and III, (c) after pretreatment I, II and III, soaking in In the respective formulations and after a 10 min DI rinse, and (d) after pretreatment I, II and III, soaking in the respective formulations, a 10 min DI rinse, and again at room temperature for 36 hours. The results are shown in Figure 4 .

Embodiment 3

[0138] A general method flow for evaluating formulations on blanketed polysilicon substrates using the F20 experiment is shown in Figure 5 .

[0139]

[0140] DMDODAC = dimethyl dioctadecyl ammonium chloride

[0141]

[0142] The contact angle of each polysilicon wafer was measured after pretreatments I, II and III, 5 minutes soaking in the respective formulations, and 10 minutes DI rinse. The results are shown in Figure 6a and Figure 6b .

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

Methods of reducing the capillary forces experienced by fragile high aspect ratio structures during drying to substantially prevent damage to said high aspect ratio structures during drying. They include modifying the surface of the high aspect ratio structures such that the forces are sufficiently minimized and as such less than 10% of the high aspect ratio features will have bent or collapsed during drying of the structure having said features thereon.

Description

[0001] Cross References to Related Applications [0002] This application claims priority to the following patent applications: U.S. Provisional Patent Application No. 61 / 377,689, filed August 27, 2010, in the name of Steven Bilodeau et al., entitled "Prevention of Collapse of High Aspect Ratio Structures During Drying" Method for Preventing the Collapse of High Aspect Ratio Structures During Drying"; U.S. Provisional Patent Application Serial No. 61 / 437,352, filed January 28, 2011 in the name of Steven Bilodeau et al., entitled "Preventing the Collapse of High Aspect Ratio Structures During Drying" Method for Collapsing Structures”; U.S. Provisional Patent Application Serial No. 61 / 378,548, filed August 31, 2010, in the name of Tianniu Chen et al., titled “Methods for Preventing Collapse of High Aspect Ratio Structures During Drying”; 2011 1 U.S. Provisional Patent Application No. 61 / 437,340, titled "Method of Preventing Collapse of High Aspect Ratio Structures During Drying," ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/302
CPCH01L21/306H01L21/302C09C3/08H01L21/02082B81C1/00619B81C1/00928
Inventor 陈天牛斯蒂芬·比洛德奥许志民中西睦松冈正弘中山文雄张鹏迈克尔·B·克尔赞斯基埃马纽尔·I·库珀凯特·维卡莱里马康南·佩恩
Owner ADVANCED TECH MATERIALS INC