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A method of forming textured microcrystalline silver on the surface of amorphous silicon film

An amorphous silicon thin film and texturing technology, applied in the field of solar energy, can solve problems such as cumbersome and complicated processes, high costs, and demanding equipment

Active Publication Date: 2015-08-19
深圳市万业隆实业有限公司
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  • Description
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Problems solved by technology

[0004] The purpose of the present invention is to overcome the above-mentioned deficiencies of the prior art, to provide a method for forming textured microcrystalline silver on the surface of an amorphous silicon film, to solve the complicated and complicated process and the need for equipment in the existing method for preparing microcrystalline silver. The requirements are relatively harsh, the cost is high, and the light absorption efficiency of the amorphous silicon thin film is low.

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  • A method of forming textured microcrystalline silver on the surface of amorphous silicon film
  • A method of forming textured microcrystalline silver on the surface of amorphous silicon film
  • A method of forming textured microcrystalline silver on the surface of amorphous silicon film

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[0017] The invention provides a method for forming textured microcrystalline silver on the surface of an amorphous silicon film. For the process flow of the preparation method, please refer to figure 1 , specifically include the following steps:

[0018] Step S01. Preparation of precursor solution: dissolving silver acetate and oxalic acid to prepare a precursor solution containing silver acetate and oxalic acid, wherein the mass ratio of silver acetate to oxalic acid is (3.2-13.1): (0.1-0.5) ;

[0019] Step S02. Coating the precursor solution on the surface of the amorphous silicon film: coating the precursor solution in step S01 on the surface of the amorphous silicon film.

[0020] Step S03. Heat treatment in situ induced growth of microcrystalline silver particles: heat-treat the coated amorphous silicon film in step S02 at 200-300° C. to form textured microcrystalline silver on the surface of the amorphous silicon film.

[0021] Specifically, in the precursor solution i...

Embodiment 1

[0030] A method of forming textured microcrystalline silver on the surface of an amorphous silicon film:

[0031] (1) Dissolve 6.5g of silver acetate (analytical pure) and 0.3g of oxalic acid (analytical pure) in 31.4g of isopropanol (analytical pure), and stir at room temperature to obtain a uniform precursor solution;

[0032] (2) Spray the precursor solution in step (1) to an area of ​​100 cm 2 The surface of the amorphous silicon film, the spraying amount is 0.8-0.9g / cm 2 ;

[0033] (3) Putting the coated amorphous silicon film in step (2) into a constant temperature drying oven, heat-treating at 250°C for 10-12 hours, and then naturally cooling to room temperature;

[0034] (4) The heat-treated amorphous silicon film in step (3) was repeatedly washed twice with deionized water or absolute ethanol, then put into a drying oven, and dried at 60°C for 10 hours to obtain sample a.

Embodiment 2

[0036] A method of forming textured microcrystalline silver on the surface of an amorphous silicon film:

[0037] (1) Dissolve 13.0g silver acetate (analytical pure) and 0.5g oxalic acid (analytical pure) in 47.1g isopropanol (analytical pure), and stir at room temperature to obtain a uniform precursor solution;

[0038] (2) Spray the precursor solution in step (1) to an area of ​​100 cm 2 The surface of the amorphous silicon film, the spraying amount is 0.8-0.9g / cm 2 ;

[0039] (3) Put the coated amorphous silicon film in step (2) into a constant temperature drying oven, heat-treat at 300°C for 20 hours, and then naturally cool to room temperature;

[0040] (4) The heat-treated amorphous silicon film in step (3) was repeatedly washed with deionized water or absolute ethanol three times, then put into a drying oven, and dried at 80°C for 12 hours to obtain sample b.

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Abstract

The invention discloses a method for forming textured microcrystalline silver on the surface of an amorphous silicon membrane. The method for forming the textured microcrystalline silver on the surface of the amorphous silicon membrane comprises the following steps that silver acetate and oxalic acid are dissolved to prepare a pecursor solution containing the silver acetate and the oxalic acid, wherein the mass ratio between the silver acetate and the oxalic acid is (3.2-13.1) : (0.1-0.5); the pecursor solution is coated on the surface of the amorphous silicon membrane; the coated amorphous silicon membrane is heated at 200-300 DEG C, and the textured microcrystalline silver is formed on the surface of the amorphous silicon membrane. Through the method, microcrystalline silver particles are induced to grow on the surface of the amorphous silicon membrane in situ, and the microcrystalline silver particles are mutually acted and are arranged irregularly, and gaps are formed among the microcrystalline silver particles. Therefore, the microcrystalline silver particles form a textured structure from the micro aspect, and the light absorption efficiency of the amorphous silicon membrane is improved. According to the method, a product can be obtained only by mixing, coating and heating raw materials, the process is simple and easy to control, the requirement for equipment is low, cost is saved, and large-scale production is easy to achieve.

Description

technical field [0001] The invention belongs to the technical field of solar energy, and in particular relates to a method for forming textured microcrystalline silver on the surface of an amorphous silicon film. Background technique [0002] At present, in order to improve the efficiency of amorphous silicon thin film solar cells, mainly by improving the light absorption efficiency of amorphous silicon thin films in the near infrared range, it is a key technology that research and technology developers urgently need to solve. The technical route generally adopted at this stage is to form silver nanoparticles on the surface of amorphous silicon film by chemical or physical methods, and use the surface plasmons of silver nanoparticles to trap light for incident light to achieve the purpose of improving device efficiency. [0003] It is well known that when the metal particles are in the range of 400-500 nm, they have a strong ability to scatter light. Therefore, preparing la...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/18H01L31/20
CPCY02P70/50
Inventor 季红
Owner 深圳市万业隆实业有限公司
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