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Photoresist coating apparatus and photoresist coating method thereof

A coating equipment and photoresist technology, applied in the coating equipment and coating fields, can solve the problems affecting the performance consistency of liquid crystal display devices, and it is difficult to ensure the uniformity of photoresist coating thickness, etc., so as to improve the uniformity and performance. consistent effect

Active Publication Date: 2015-07-22
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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  • Description
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  • Application Information

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Problems solved by technology

However, the thickness of the substrate varies from one end of the substrate to the other, and the existing coating device keeps the distance between the nozzle and the substrate constant when coating the photoresist, so it is difficult to ensure the uniformity of the photoresist coating thickness. Uniformity, which affects the consistency of the performance of liquid crystal display devices

Method used

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  • Photoresist coating apparatus and photoresist coating method thereof
  • Photoresist coating apparatus and photoresist coating method thereof
  • Photoresist coating apparatus and photoresist coating method thereof

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Embodiment Construction

[0022] It should be understood that the specific embodiments described here are only used to explain the present invention, and are not intended to limit the present invention.

[0023] Such as Figure 1 to Figure 3 Shown is a preferred embodiment of the photoresist coating equipment of the present invention.

[0024] The photoresist coating equipment is used for coating photoresist on the substrate 10 of the liquid crystal display device.

[0025] The photoresist coating equipment includes a platform 20 , a photoresist coating device 30 and a detector 40 , and the platform 20 is used to place and fix the substrate 10 to be coated with photoresist. The photoresist coating device 30 includes a control mechanism 31 and a nozzle 32 located above the platform 20 . The detector 40 is arranged on both sides of the platform 20 and moves synchronously with the photoresist coating device 30, and is used to measure the height of the surface position of the substrate 10 to be coated wi...

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Abstract

The invention provides a photoresist coating apparatus and a photoresist coating method thereof. The photoresist coating apparatus comprises a platform and a photoresist coating device, the platform is used for placing and fixing a substrate for photoresist coating, the photoresist coating device comprises a control mechanism and a nozzle which are positioned over the platform, the photoresist coating apparatus further comprises a detector arranged at two sides of the platform and synchronously moving with the photoresist coating device, the detector is used for measuring the height of the surface position of the substrate for photoresist coating and feedbacks the obtained measure result to the control mechanism of the photoresist coating device in real time, and the photoresist coating of the surface position of the substrate for photoresist coating is carried out by the nozzle after the coating height of the nozzle is corrected by the control mechanism according to the measure result. The photoresist coating device and the photoresist coating method can increase the uniformity of the coating thickness of photoresist on the substrate.

Description

technical field [0001] The invention relates to a coating device and a coating method, in particular to a photoresist coating device and a photoresist coating method for coating photoresist materials. Background technique [0002] In the manufacturing process of liquid crystal display devices, it is necessary to evenly coat a layer of photoresist material with a specific thickness on the substrate to facilitate the production of circuit patterns. The substrate is usually a glass substrate, and a metal thin film, an insulating layer, a semiconducting layer, etc. have been formed on the surface of the glass substrate before coating the photoresist. At present, a nozzle-type coating device is usually used to coat a photoresist on a substrate. By moving the nozzle of the coating device from one end of the substrate to the other end of the substrate, the photoresist material is continuously sprayed on the surface of the substrate to form on the substrate. A layer of photoresist ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C17/00
Inventor 蔡金龙郑宪鸿
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
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