Protection mechanism in glass etching device
A technology of etching device and protection mechanism, applied in the field of protection mechanism and protection mechanism in glass etching device, can solve the problems of large area and uneven etching, and achieve the effect of avoiding uneven etching and reducing contact area
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[0012] The protection mechanism in the glass etching device of the present invention will be further described in detail through specific embodiments below.
[0013] Such as figure 2 and image 3 As shown, the protective mechanism in the glass etching device includes an isolation rod 1 and an O-ring 2 arranged on the isolation rod 1. The surface of the O-ring 2 is symmetrically provided with two obliquely upward thimbles 3. The O-ring 2 is made of PVC material.
[0014] Before glass etching, the protective mechanism is placed between two pieces of glass, and the two thimbles 3 are in contact with the glass. Since the contact area between the glass and the O-ring 2 is reduced, uneven etching can be avoided.
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