Protection mechanism in glass etching device
A technology of etching device and protection mechanism, applied in the field of protection mechanism and protection mechanism in glass etching device, can solve the problems of large area and uneven etching, and achieve the effect of avoiding uneven etching and reducing contact area
Inactive Publication Date: 2013-11-20
惠晶显示科技(苏州)有限公司
View PDF5 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
However, because the area of the O-ring 2 in contact with the glass is relatively large, the contact part with the glass is prone to uneven etching.
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0012] The protection mechanism in the glass etching device of the present invention will be further described in detail through specific embodiments below.
[0013] Such as figure 2 and image 3 As shown, the protective mechanism in the glass etching device includes an isolation rod 1 and an O-ring 2 arranged on the isolation rod 1. The surface of the O-ring 2 is symmetrically provided with two obliquely upward thimbles 3. The O-ring 2 is made of PVC material.
[0014] Before glass etching, the protective mechanism is placed between two pieces of glass, and the two thimbles 3 are in contact with the glass. Since the contact area between the glass and the O-ring 2 is reduced, uneven etching can be avoided.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention relates to a protection mechanism in a glass etching device. The protection mechanism comprises a spacer bar and an O-shaped ring on the spacer bar, and two upwards slant centres are symmetrically arranged on the surface of the O-shaped ring. The protection mechanism is suitable for glass etching.
Description
technical field [0001] The invention relates to the field of protection mechanisms in glass etching devices, in particular to a protection mechanism in glass etching devices. Background technique [0002] In glass etching, glass is etched neatly in glass baskets. When the size of the glass is relatively large, the glass and the glass are easy to collide with each other, causing the glass to be scratched and resulting in defects after etching. The traditional way is to place spacer 1 between glass and glass, the structure of spacer 1 is as follows figure 1 As shown, an O-ring 2 is sheathed on the spacer rod 1, so as to avoid glass-to-glass contact. However, because the area of the O-ring 2 in contact with the glass is relatively large, uneven etching is likely to occur at the contact portion with the glass. Contents of the invention [0003] The technical problem to be solved by the present invention is to provide a protection mechanism in a glass etching device that d...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
Inventor 尹龙贤郭廷君
Owner 惠晶显示科技(苏州)有限公司

