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Manufacturing method of tft array substrate, tft array substrate, and display device

A technology for array substrates and substrates, which is applied in the fields of TFT array substrates, display equipment, and TFT array substrates. It can solve the problems of complex process flow and many times of masking, and achieve the effect of saving masks and reducing the complexity of process flow.

Inactive Publication Date: 2015-12-02
BEIJING BOE OPTOELECTRONCIS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, at present, when manufacturing TFT array substrates, the gate layer pattern is usually first formed through a mask, and then the active layer pattern is formed through a mask. The number of masks is many, and the process flow is more complicated.

Method used

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  • Manufacturing method of tft array substrate, tft array substrate, and display device
  • Manufacturing method of tft array substrate, tft array substrate, and display device
  • Manufacturing method of tft array substrate, tft array substrate, and display device

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Embodiment Construction

[0055] Embodiments of the present invention provide a method for manufacturing a TFT array substrate, a TFT array substrate, and a display device. When patterning a gate layer, a gate insulating layer, and an active layer, sequentially deposit gate layer materials, gate insulating layer materials, The active layer material realizes the fabrication of the gate layer, the gate insulating layer and the active layer through one patterning, which saves at least one mask and reduces the complexity of the process flow.

[0056] Such as figure 1 As shown, the embodiment of the present invention provides a method for manufacturing a TFT array substrate, including:

[0057] Step S101, sequentially depositing gate layer material, gate insulating layer material, and active layer material on the substrate;

[0058] Step S102, forming a gate layer and an active layer by patterning once, and retaining a mask pattern in the active layer region;

[0059] Step S103, depositing gate insulating...

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Abstract

Provided are a manufacturing method for a TFT array substrate, a TFT array substrate and a display device. When patterns of a gate layer (2), a gate insulating layer (3) and an active layer are manufactured, a material of the gate layer (2), a material of the gate insulating layer (3) and a material of the active layer are deposited successively, and the gate layer (2), the gate insulating layer (3) and the active layer are manufactured through one patterning process. Therefore, at least one masking process is cut down on, and the complexity of the process flow is reduced.

Description

technical field [0001] The invention relates to liquid crystal display technology, in particular to a method for manufacturing a TFT array substrate, a TFT array substrate, and a display device. Background technique [0002] TFT-LCD (ThinFilmTransistorLiquidCrystalDisplay, Thin Film Transistor Liquid Crystal Display) is currently the only display device that has fully caught up with and surpassed CRT (CathodeRayTube) in terms of brightness, contrast, power consumption, life, volume and weight. At the same time, it also puts forward higher and higher requirements for performance. At present, high-resolution, low-power TFT-LCD products have become the focus of development and hot spot of research and development. [0003] However, at present, when manufacturing a TFT array substrate, the gate layer pattern is usually firstly formed through a mask, and then the active layer pattern is formed through a mask. The number of masks is many, and the process flow is relatively compli...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/84H01L27/12
CPCH01L27/1288
Inventor 姜晓辉张家祥
Owner BEIJING BOE OPTOELECTRONCIS TECH CO LTD