Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Active cooling type one-dimensional wave surface correction device

A technology of active cooling and wavefront correction, applied in optical components, optics, instruments, etc., can solve problems such as mirror thermal distortion, reduce additional surface changes, solve existing technical problems, and maintain the effect of beam quality

Active Publication Date: 2014-04-16
INST OF APPLIED ELECTRONICS CHINA ACAD OF ENG PHYSICS
View PDF6 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide an active cooling type one-dimensional wavefront correction device in order to overcome a series of deficiencies such as the influence of the stripe-shaped spot wavefront fluctuation on the beam quality and the thermal distortion of the mirror due to inadequate control measures in the optical system.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Active cooling type one-dimensional wave surface correction device
  • Active cooling type one-dimensional wave surface correction device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0018] Such as figure 1 As shown, it is an active cooling type one-dimensional wave surface correction device of the present invention, including a base 3, the base 3 is made of Invar material, a cooling plate 4 is arranged on the top of the base, and a cooling cavity is arranged in the middle of the cooling plate 4; There is a row of through holes at the bottom of the cooling cavity, such as figure 2 As shown, a driver 7 passes through each through hole, and the gap between the driver 7 and the through hole is sealed with waterproof glue. The drivers 7 are arranged inside the base 3 , and each row of drivers 7 in the width direction is connected in parallel, and is connected to an external control system through the connector 5 on the base 3 to form a loop. The arrangement of the drivers 7 matches the shape of the one-dimensional wave surface that needs to be corrected, and each row of drivers in the width direction is connected in parallel and expands and contracts at the ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an active cooling type one-dimensional wave surface correction device which comprises a base, an actuator and a lens. A cooling cavity is formed in the top of the base, a water inlet is formed in one end of the cooling cavity, and a water outlet is formed in the other end of the cooling cavity. A through hole is formed in the bottom of the cooling cavity, and the actuator is arranged on the base and adheres to the lens through the through hole in the bottom of the cooling cavity, wherein the cooling cavity is covered with the lens. A cooling material flows in through a water mouth at the bottom of a cooling plate and flows from a water mouth in the top, the cooling material in the cooling cavity fully conducts heat exchange with the lens, so that active cooling is achieved. When weave surface fluctuation in the length direction of a strip-shaped light spot is found through Hartmann detection, a corresponding current or voltage is loaded on the corresponding actuator through a connector, the actuator drives a lens face to vertically move, and the lens face is deformed, so that one-dimensional correction of the weave face shape is achieve.

Description

technical field [0001] The invention belongs to the field of wavefront correction in adaptive optical systems, in particular to an active cooling type one-dimensional wavefront correction device, which is used for one-dimensional correction of the wavefront of striped light spots. Background technique [0002] In an optical system, the beam quality β value of the emitted beam is an important indicator of the system, and the quality of the beam wavefront is directly related to the beam quality. In order to reduce the beam quality, external measures generally adopted at present are to minimize the influence of thermal effects, turbulence, noise, etc. The wave front in the length direction fluctuates greatly, and there are many high-order components, but there is no big change in the width direction. The technical measures taken above are difficult to effectively control the wave front. For beams with high power density, the thermal distortion of the mirror surface Additional ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B26/08
Inventor 范国滨李国会张卫何忠武杨媛徐宏来向汝建吴晶胡平罗亦耕杜应磊
Owner INST OF APPLIED ELECTRONICS CHINA ACAD OF ENG PHYSICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com