The invention relates to a method and apparatus for preparing black silica by adopting lattice scanning. The method includes the following steps that: 1, a
silicon wafer is arranged in a doped material-containing
sample chamber; 2, a single
laser beam of a pulse
laser passes through a diaphragm, a reflector, a
half wave plate, a
polarizer, a
shutter, a beam expanding mirror, a focusing lens, a Dammann
grating and the like, so that lattice
laser can be obtained; 3, the lattice laser irradiates on the surface of the
silicon wafer, and a computer controls the opening and closing of the
shutter and the movement of a three-dimensional translational platform, and therefore, lattice scanning can be realized, and a black silica material of which the surface is of a micro pointed cone structure can be obtained. According to the method and apparatus of the invention, the Dammam
grating is adopted, and the
single beam laser can be converted into two-dimensional and equal-
light intensity array beams; when the Dammam
grating splits the laser beam, the influence of chromatic dispersion in the light splitting process of an ordinary semi-
transmittance and semi-reflection mirror can be avoided, and the quality of the split light beams can be ensured; and point-by-point scanning adopted for preparing the black silica is converted into lattice scanning, and therefore, the preparation efficiency of the black silica can be greatly improved.