Cone semiconductor laser
A laser and semiconductor technology, applied in the direction of semiconductor lasers, lasers, laser parts, etc., to achieve the effect of increasing the length, the beam quality is not easy to deteriorate, and the high power
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[0021] Applications in GaAs-based 980 nm lasers:
[0022] Epitaxial structure:
[0023] The substrate layer is 350 μm, the lower confinement layer is 700 nm, the waveguide layer is 2400 nm, the upper confinement layer is 700 nm, and the contact layer is 200 nm.
[0024] Chip structure:
[0025] 1) Ridge area length: 1 mm;
[0026] 2) Ridge area width: 5 μm;
[0027] 3) Ridge etching depth: 1.0 𝛍m;
[0028] 4) Bragg mirror: etching depth 1.3 𝛍m, period 300 nm, logarithm 1000 pairs;
[0029] 5) Angle of cone area: 4 degrees;
[0030] 6) Length of tapered area: 4 mm;
[0031] 7) Etching depth of tapered area: 200 nm;
[0032] 8) Front cavity surface corrosion: ethylene glycol: 30% phosphoric acid: hydrogen peroxide = 20:5:1, corrosion depth 3.5 μm;
[0033] 9) Cavity surface coating: the reflection rate of the rear cavity surface is coated with high reflection film, and the reflection rate of the front cavity surface is 0.1%.
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