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Protection of edge exclusion mask shielding

A mask, mask technology, applied in the protection field of edge exclusion mask shading, can solve problems such as high maintenance requirements, complexity, etc.

Active Publication Date: 2014-04-23
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The effect of a non-coated mask versus a coated mask can be complex and may depend on the material to be deposited
Furthermore, the application of an edge exclusion mask, a mask in general or components of a masking arrangement including a mask, a mask support frame, and other elements (such as a protective shield), may result in higher maintenance needs

Method used

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  • Protection of edge exclusion mask shielding
  • Protection of edge exclusion mask shielding
  • Protection of edge exclusion mask shielding

Examples

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Embodiment Construction

[0020] Reference will now be made in detail to various embodiments of the invention, one or more examples of which are illustrated in the accompanying drawings. In the ensuing description of the drawings, the same reference numerals refer to the same elements. In general, only differences are described in various implementations. Each embodiment is provided as an example of the invention, and not intended as a limitation of the invention. Furthermore, features illustrated or described as part of one embodiment can be used on or in conjunction with other embodiments to yield yet a further embodiment. These descriptions are subject to modification and variation as so stated.

[0021] According to some embodiments, a mask structure or "edge exclusion mask" is to be understood as a mask covering at least one edge of the substrate to be coated. In general, a mask may consist of several parts or portions forming a frame defining one or more apertures. The frame of the mask can a...

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Abstract

A masking arrangement (300) for masking a substrate during layer deposition is described. The masking arrangement includes a mask structure (340) forming an aperture for exposing the substrate during a layer deposition, and a protection shield (150), which is provided adjacent to the masking structure, wherein the protection shield protects one or more portions of the masking arrangement from being coated during layer deposition, and wherein an interface (360) is formed between the protection shield and the masking structure, and wherein the mask structure comprises a roof portion (342) extending over the interface, and wherein the roof portion forms a gap (344) with a portion of the protection shield.

Description

technical field [0001] Embodiments of the invention relate to masking arrangements and / or masks for layer deposition, and methods for layer deposition using masking arrangements and / or masks. Embodiments of the invention relate in particular to edge exclusion masks and methods of layer deposition using edge exclusion masks, particularly masking arrangements for masking substrates during layer deposition, on which substrates are used to deposit A layered device, and a method of depositing a layered body on a substrate. Background technique [0002] Several methods are known to deposit materials on substrates, for example, physical vapor deposition (Physical Vapor Deposition, PVD) process, chemical vapor deposition (Chemical Vapor Deposition, CVD) process, plasma enhanced chemical vapor deposition process can be used on the substrate (Plasma Enhanced Chemical Vapor Deposition, PECVD) etc. for coating. Generally speaking, the above-mentioned processes are carried out in a pro...

Claims

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Application Information

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IPC IPC(8): C23C14/04C23C16/04
CPCC23C14/042C23C16/042
Inventor C·灿格尔R·林德伯格H·吴尔斯特H·汉森
Owner APPLIED MATERIALS INC