Alignment method for nanolithography based on moiré fringe phase demodulation of spliced gratings
A moiré fringe and nano-lithography technology, which is applied to the photoplate process, optics, and instruments of the patterned surface, can solve problems that affect alignment accuracy and reduce alignment efficiency, improve accuracy and efficiency, and avoid scanning , the effect of high sensitivity
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[0014] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in further detail below in conjunction with specific embodiments and with reference to the accompanying drawings.
[0015] Such as Figure 4 Alignment deviation Δx of mask-substrate center in x and y directions shown w , Δy w , the azimuth angle of the substrate relative to the mask is α. The two fixed points on the substrate are A(x A ,y A ), B(x B ,y B ), when there is no misalignment between the mask and the substrate, the point on the mask corresponding to the fixed points A and B on the substrate is A’(x’ A ,y' A ), B'(x' B ,y' B ). Make alignment marks at A, B, A', B' respectively. marked according to figure 1 The structure shown is fabricated. Among them, due to the deviation x and y directions are not aligned, the marks of A and A' will be produced as figure 2 (c) Moiré fringes shown. The same is true for B and ...
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